New Developments in Hollow Cathode Gas Flow Sputtering;Neue Entwicklungen beim Hohlkatoden-Gasflusssputtern

Vakuum in Forschung und Praxis

Volumn 15, Issue 5, 2003, Pages 236-239

  Ortner, Kai ^b   Birkholz, Mario ^a   Jung, Thomas ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; CERAMIC COATINGS; FLOW OF FLUIDS; GASES;

GAS FLOW SPUTTERING;

SPUTTERING;

EID: 0242578374     PISSN: 0947076X     EISSN: None     Source Type: Journal    
DOI: 10.1002/vipr.200300196     Document Type: Article

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