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Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

VHF roll coater plasma polymerisation system

(5) Schmittgens, Ralph a Meyer, Bjoern b Stahr, Frank c Schade, Klaus c Schultheiss, Eberhard a

a DRESDEN UNIVERSITY OF TECHNOLOGY (Germany)

b UNIVERSITY OF APPLIED SCIENCES MITTWEIDA (Germany)

c Forschungs und Applikationslabor Plasmatechnik GmbH (Germany)

Author keywords

Hexamethyldisiloxane (HMDSO); HF discharges; Plasma polymerization; Plasma enhanced chemical vapor deposition (PECVD); Surface energy

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; GAS COMPOSITIONS; HEXAMETHYLDISILOXANE (HMDSO); HF DISCHARGES; INORGANIC OXIDES; ORGANIC PRECURSOR; OXYGEN PLASMAS; PLASMA POLYMERISATION; PLASMA POLYMERS; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); POLYMERIC SUBSTRATE; PRECURSOR CONTENT; ROLL-TO-ROLL PROCESS; SURFACE ENERGY; THIN-FILM PROPERTIES;

ANGLE MEASUREMENT; CONTACT ANGLE; FILM PREPARATION; INFRARED SPECTROSCOPY; INTERFACIAL ENERGY; ORGANIC POLYMERS; OXYGEN; PLASMA DEPOSITION; PLASMA POLYMERIZATION; PLASMAS; POLYMERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON OXIDES; SPECTROSCOPIC ANALYSIS; SURFACE CHEMISTRY; SURFACE DISCHARGES; SURFACE TENSION; VAPORS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 70349428506 PISSN: 16128850 EISSN: 16128869 Source Type: Journal
DOI: 10.1002/ppap.200731915 Document Type: Conference Paper

Times cited : (3)

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