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Volumn 80, Issue 23, 2009, Pages

Insulating conduction in Sn/Si(111): Possibility of a Mott insulating ground state and metallization/localization induced by carrier doping

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EID: 77954719387     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.80.235419     Document Type: Article
Times cited : (19)

References (34)
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    • The large difference in the activation energies of Figs. are possibly due to the difference found in the pre factor σ0; σ0 in Fig. is an order of magnitude larger than those found in Fig. .
    • The large difference in the activation energies of Figs. are possibly due to the difference found in the pre factor σ 0; σ 0 in Fig. is an order of magnitude larger than those found in Fig.
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    • We also note that position of the bulk band peak measured at normal emission in the ARPES measurements showed little change in energy position when carriers were doped on the Si (111 ) √3×√3-Sn phase. This means that the space-charge layer is still a depletion layer and its conductivity can also be neglected for the carrier-doped surfaces, similar to the case of the pristine surface.
    • We also note that position of the bulk band peak measured at normal emission in the ARPES measurements showed little change in energy position when carriers were doped on the Si (111) √ 3 × √ 3 -Sn phase. This means that the space-charge layer is still a depletion layer and its conductivity can also be neglected for the carrier-doped surfaces, similar to the case of the pristine surface


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