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Volumn , Issue , 2010, Pages
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Analysis of SRAM reliability under combined effect of NBTI, process and temperature variations in nano-scale CMOS
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Author keywords
[No Author keywords available]
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Indexed keywords
6T-SRAM;
ACCESS TIME;
AGING EFFECTS;
AGING PHENOMENA;
BIASED TEMPERATURE INSTABILITIES;
CMOS TECHNOLOGY;
COMBINED EFFECT;
DEVICE PERFORMANCE;
FAULTY CELLS;
HIGHER TEMPERATURES;
LIMITING FACTORS;
MOS-FET;
NANO SCALE;
RELIABILITY PROBLEMS;
STATIC RANDOM ACCESS MEMORY;
TEMPERATURE VARIATION;
TRAPPED CHARGE;
WORST CASE;
CMOS INTEGRATED CIRCUITS;
DEGRADATION;
INFORMATION TECHNOLOGY;
MOS DEVICES;
NANOSTRUCTURED MATERIALS;
RELIABILITY ANALYSIS;
TEMPERATURE DISTRIBUTION;
THRESHOLD VOLTAGE;
STATIC RANDOM ACCESS STORAGE;
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EID: 77954418524
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/FUTURETECH.2010.5482682 Document Type: Conference Paper |
Times cited : (17)
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References (8)
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