Virtual metrology for plasma particle in plasma etching equipment

IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Volumn , Issue , 2007, Pages 346-349

  Imai, Shin Ichi ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATION METHODS; ELECTRIC CONDUCTIVITY; EQUIPMENT; ETCHING; FORECASTING; PARAMETER ESTIMATION; PLASMA DENSITY; PLASMA ETCHING; PLASMA JETS; PLASMA SOURCES; SEMICONDUCTOR MATERIALS;

PLASMA PARTICLES;

PLASMA DIAGNOSTICS;

EID: 50349085958     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISSM.2007.4446835     Document Type: Conference Paper

References (9)

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3. K. Miyasaka, S. Imai, and M. Taguchi, "Development of monitoring technology for CMP equipment state in a 200mm wafer factory," in Proceedings of ISSM2002, Oct. Tokyo, pp 509-512.
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5. S. Imai, K. Miyasaka, and N. Sato, "Development of monitoring technology for wafer transfer state in resist coater," in Proceedings of ISSM2004, Sept. Tokyo, pp 310-313.
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