Analysis of Fe nanoparticles using XPS measurements under d.c. or pulsed-voltage bias

Surface and Interface Analysis

Volumn 42, Issue 6-7, 2010, Pages 859-862

  Suzer, Sefik ^a   Baer, Donald R ^b   Engelhard, Mark H ^b  

^a BILKENT UNIVERSITY   (Turkey)

^b PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

Casting from different solvents; Charging shifts; Fe nanoparticles; XPS

Indexed keywords

ADVENTITIOUS CARBON; CHARGING PROPERTY; CHARGING SHIFTS; DIFFERENT SOLVENTS; FE METAL; IN-BETWEEN; IONIC MOVEMENT; IRON NANOPARTICLES; IRON OXIDE NANOPARTICLE; LOW ENERGY ELECTRONS; LOW-ENERGY AR; OVERLAPPING PEAKS; OXIDE COATING; SHELL NANOPARTICLES; SILICON OXIDE SUBSTRATES; SQUARE WAVES; TIME CONSTANTS; VOLTAGE BIAS; VOLTAGE STRESS; XPS; XPS MEASUREMENTS;

ACETONE; IONIZATION OF LIQUIDS; IRON OXIDES; METHANOL; PROTECTIVE COATINGS; SILICON COMPOUNDS; SILICON OXIDES; SOLVENTS; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOPARTICLES;

EID: 77954305899     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3260     Document Type: Conference Paper

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