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Volumn 28, Issue 4, 2010, Pages 515-522

Deposition of aluminum-doped zinc oxide thin films for optical applications using rf and dc magnetron sputter deposition

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM-DOPED ZINC OXIDE; ASAHI GLASS; BAND GAPS; DIELECTRIC DEPOSITION; EFFECT OF OXYGEN; ELECTRICAL AND OPTICAL PROPERTIES; FILM PROPERTIES; GLASS SUBSTRATES; MAGNETRON POWER; MAGNETRON SPUTTER DEPOSITION; OPTICAL APPLICATIONS; OXYGEN PARTIAL PRESSURE; PHOTOVOLTAIC APPLICATIONS; PROCESS CONDITION; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SPUTTERED FILMS; ZNO;

EID: 77954210173     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3425640     Document Type: Conference Paper
Times cited : (14)

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