-
1
-
-
0032624139
-
-
ASUSEE 0169-4332,. 10.1016/S0169-4332(98)00654-0
-
Y. Nakanishi, A. Miyake, and H. Kominami, Appl. Surf. Sci. ASUSEE 0169-4332 142, 233 (1999). 10.1016/S0169-4332(98)00654-0
-
(1999)
Appl. Surf. Sci.
, vol.142
, pp. 233
-
-
Nakanishi, Y.1
Miyake, A.2
Kominami, H.3
-
2
-
-
0033688035
-
-
JCRGAE 0022-0248,. 10.1016/S0022-0248(00)00068-3
-
K. Haga, M. Kamidaira, and Y. Kashiwaba, J. Cryst. Growth JCRGAE 0022-0248 214-215, 77 (2000). 10.1016/S0022-0248(00)00068-3
-
(2000)
J. Cryst. Growth
, vol.214-215
, pp. 77
-
-
Haga, K.1
Kamidaira, M.2
Kashiwaba, Y.3
-
3
-
-
0033221413
-
Growth of polycrystalline GaN on silicon (001) substrates by RF plasma chemical vapor deposition with ZnO buffer layer
-
DOI 10.1002/(SICI)1521-396X(199911)176:1<579::AID-PSSA579>3.0.CO;2- N
-
D. C. Park, Sz. Fujita, and Sg. Fujita, Phys. Status Solidi A PSSABA 0031-8965 176, 579 (1999). 10.1002/(SICI)1521-396X(199911)176:1<579::AID- PSSA579>3.0.CO;2-N (Pubitemid 32082040)
-
(1999)
Physica Status Solidi (A) Applied Research
, vol.176
, Issue.1
, pp. 579-582
-
-
Park, D.C.1
Fujita, Sz.2
Fujita, Sg.3
-
4
-
-
0033896905
-
Magnetron sputtering: A review of recent developments and applications
-
DOI 10.1016/S0042-207X(99)00189-X
-
P. J. Kelly and R. D. Arnell, Vacuum VACUAV 0042-207X 56, 159 (2000). 10.1016/S0042-207X(99)00189-X (Pubitemid 30564470)
-
(2000)
Vacuum
, vol.56
, Issue.3
, pp. 159-172
-
-
Kelly, P.J.1
Arnell, R.D.2
-
5
-
-
15844366596
-
Growth of Al-doped ZnO thin films by pulsed DC magnetron sputtering
-
DOI 10.1016/j.jcrysgro.2005.01.061, PII S0022024805000953
-
H. Ko, W. P. Tai, K. C. Kim, S. H. Kim, S. J. Suh, and Y. S. Kim, J. Cryst. Growth JCRGAE 0022-0248 277, 352 (2005). 10.1016/j.jcrysgro.2005.01.061 (Pubitemid 40424451)
-
(2005)
Journal of Crystal Growth
, vol.277
, Issue.1-4
, pp. 352-358
-
-
Ko, H.1
Tai, W.-P.2
Kim, K.-C.3
Kim, S.-H.4
Suh, S.-J.5
Kim, Y.-S.6
-
6
-
-
71049188085
-
-
JVTAD6 0734-2101,. 10.1116/1.3242421
-
Wonkyun Yang and Junghoon Joo, J. Vac. Sci. Technol. A JVTAD6 0734-2101 27, 1310 (2009). 10.1116/1.3242421
-
(2009)
J. Vac. Sci. Technol. A
, vol.27
, pp. 1310
-
-
Yang, W.1
Joo, J.2
-
7
-
-
0035123978
-
Argon gas pressure dependence of the properties of transparent conducting ZnO:Al films deposited on glass substrates
-
DOI 10.1016/S0169-4332(00)00748-0
-
Y. Igasaki and H. Kanma, Appl. Surf. Sci. ASUSEE 0169-4332 169-170, 508 (2001). 10.1016/S0169-4332(00)00748-0 (Pubitemid 32195627)
-
(2001)
Applied Surface Science
, vol.169-170
, pp. 508-511
-
-
Igasaki, Y.1
Kanma, H.2
-
9
-
-
75649111680
-
-
JVTBD9 1071-1023,. 10.1116/1.3110020
-
C. Lennon, R. Kodama, Y. Chang, S. Sivanathan, and M. Deshpande, J. Vac. Sci. Technol. B JVTBD9 1071-1023 27, 1641 (2009). 10.1116/1.3110020
-
(2009)
J. Vac. Sci. Technol. B
, vol.27
, pp. 1641
-
-
Lennon, C.1
Kodama, R.2
Chang, Y.3
Sivanathan, S.4
Deshpande, M.5
-
10
-
-
29344436064
-
-
KPSJAS 0374-4884.
-
Jinsu Yoo, S. K. Dhungel, M. Gowtham, J. Yi, J. Lee, S. Kim, K. Yoon, I. J. Park, and J. Song, J. Korean Phys. Soc. KPSJAS 0374-4884 47, S576 (2005).
-
(2005)
J. Korean Phys. Soc.
, vol.47
, pp. 576
-
-
Yoo, J.1
Dhungel, S.K.2
Gowtham, M.3
Yi, J.4
Lee, J.5
Kim, S.6
Yoon, K.7
Park, I.J.8
Song, J.9
-
11
-
-
34247524120
-
Comparative study of zinc oxide and aluminum doped zinc oxide transparent thin films grown by direct current magnetron sputtering
-
DOI 10.1016/j.tsf.2006.11.151, PII S0040609006013927
-
M. Suchea, S. Christoulakis, N. Katsarakis, T. Kitsopolous, and G. Kiriakidis, Thin Solid Films THSFAP 0040-6090 515, 6562 (2007). 10.1016/j.tsf.2006.11.151 (Pubitemid 46660898)
-
(2007)
Thin Solid Films
, vol.515
, Issue.16 SPEC. ISS.
, pp. 6562-6566
-
-
Suchea, M.1
Christoulakis, S.2
Katsarakis, N.3
Kitsopoulos, T.4
Kiriakidis, G.5
-
12
-
-
36549094294
-
-
JAPIAU 0021-8979,. 10.1063/1.342419
-
Z. C. Jin, I. Hamberg, and C. G. Granqvist, J. Appl. Phys. JAPIAU 0021-8979 64, 5117 (1988). 10.1063/1.342419
-
(1988)
J. Appl. Phys.
, vol.64
, pp. 5117
-
-
Jin, Z.C.1
Hamberg, I.2
Granqvist, C.G.3
-
13
-
-
0031212013
-
-
THSFAP 0040-6090,. 10.1016/S0040-6090(97)00215-0
-
K. C. Park, D. Y. Ma, and K. H. Kim, Thin Solid Films THSFAP 0040-6090 305, 201 (1997). 10.1016/S0040-6090(97)00215-0
-
(1997)
Thin Solid Films
, vol.305
, pp. 201
-
-
Park, K.C.1
Ma, D.Y.2
Kim, K.H.3
-
14
-
-
0037463269
-
-
THSFAP 0040-6090,. 10.1016/S0040-6090(03)00014-2
-
J. -H. Lee and B. -O. Park, Thin Solid Films THSFAP 0040-6090 426, 94 (2003). 10.1016/S0040-6090(03)00014-2
-
(2003)
Thin Solid Films
, vol.426
, pp. 94
-
-
Lee, J.-H.1
Park, B.-O.2
-
15
-
-
0035208404
-
Influence of the annealing conditions on the properties of ZnO thin films
-
DOI 10.1016/S1466-6049(01)00113-1, PII S1466604901001131
-
P. Nunes, E. Fortunato, and R. Martins, Int. J. Inorg. Mater. IJIMCR 1466-6049 3, 1125 (2001). 10.1016/S1466-6049(01)00113-1 (Pubitemid 33151762)
-
(2001)
International Journal of Inorganic Materials
, vol.3
, Issue.8
, pp. 1125-1128
-
-
Nunes, P.1
Fortunato, E.2
Martins, R.3
-
16
-
-
0033314480
-
Optical and electronic properties of transparent conducting ZnO and ZnO:Al films prepared by evaporating method
-
DOI 10.1016/S0040-6090(99)00357-0
-
M. Jin, J. Feng, Z. De-heng, M. Hong-lei, and L. Shu-ying, Thin Solid Films THSFAP 0040-6090 357, 98 (1999). 10.1016/S0040-6090(99)00357-0 (Pubitemid 30546417)
-
(1999)
Thin Solid Films
, vol.357
, Issue.2
, pp. 98-101
-
-
Jin, M.1
Feng, J.2
De-Heng, Z.3
Hong-Lei, M.4
Shu-Ying, L.5
-
17
-
-
0003759821
-
-
(Institute of Physics, London).
-
H. L. Hartnagel, A. L. Dawar, A. K. Jain, and C. Jagadish, Semiconducting Transparent Films (Institute of Physics, London, 1995).
-
(1995)
Semiconducting Transparent Films
-
-
Hartnagel, H.L.1
Dawar, A.L.2
Jain, A.K.3
Jagadish, C.4
-
18
-
-
0001590465
-
-
JAPIAU 0021-8979,. 10.1063/1.362842
-
V. Gupta and A. Mansingh, J. Appl. Phys. JAPIAU 0021-8979 80, 1063 (1996). 10.1063/1.362842
-
(1996)
J. Appl. Phys.
, vol.80
, pp. 1063
-
-
Gupta, V.1
Mansingh, A.2
-
19
-
-
0000139470
-
-
JAPIAU 0021-8979,. 10.1063/1.366798
-
R. Cebulla, R. Wendt, and K. Ellmer, J. Appl. Phys. JAPIAU 0021-8979 83, 1087 (1998). 10.1063/1.366798
-
(1998)
J. Appl. Phys.
, vol.83
, pp. 1087
-
-
Cebulla, R.1
Wendt, R.2
Ellmer, K.3
-
20
-
-
31144466486
-
Post-growth annealing of zinc oxide thin films pulsed laser deposited under enhanced oxygen pressure on quartz and silicon substrates
-
DOI 10.1016/j.mseb.2005.10.012, PII S0921510705006689
-
M. Rusop, K. Uma, T. Soga, and T. Jimbo, Mater. Sci. Eng., B MSBTEK 0921-5107 127, 150 (2006). 10.1016/j.mseb.2005.10.012 (Pubitemid 43133007)
-
(2006)
Materials Science and Engineering B: Solid-State Materials for Advanced Technology
, vol.127
, Issue.2-3
, pp. 150-153
-
-
Rusop, M.1
Uma, K.2
Soga, T.3
Jimbo, T.4
-
21
-
-
0001447933
-
-
PRBMDO 0163-1829,. 10.1103/PhysRevB.37.10244
-
B. E. Sernelius, K. F. Berggren, Z. C. Jin, I. Hamberg, and C. G. Granqvist, Phys. Rev. B PRBMDO 0163-1829 37, 10244 (1988). 10.1103/PhysRevB.37. 10244
-
(1988)
Phys. Rev. B
, vol.37
, pp. 10244
-
-
Sernelius, B.E.1
Berggren, K.F.2
Jin, Z.C.3
Hamberg, I.4
Granqvist, C.G.5
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