SCOPUS 정보 검색 플랫폼

Volumn 107, Issue 12, 2010, Pages

Evaluation of GeO desorption behavior in the metal/GeO2/Ge structure and its improvement of the electrical characteristics

(4) Oniki, Yusuke a Koumo, Hideo a Iwazaki, Yoshitaka a Ueno, Tomo a

a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DESORPTION BEHAVIOR; ELECTRICAL CHARACTERISTIC; ELECTRICAL PROPERTY; FLAT-BAND VOLTAGE SHIFT; GE SUBSTRATES; LOW TEMPERATURES; MINORITY CARRIER GENERATION; POST-METALLIZATION ANNEALING; THERMAL OXIDATION;

CAPACITANCE; CAPACITORS; OXIDATION; SURFACE CHEMISTRY; THERMAL DESORPTION; THERMAL DESORPTION SPECTROSCOPY;

GERMANIUM;

EID: 77954197457 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3452367 Document Type: Article

Times cited : (40)

References (16)

1
- 84982383110
- ZAACAB 0044-2313. 10.1002/zaac.19512660602
- W. Bues and H. V. Wartenberg, Z. Anorg. Allg. Chem. ZAACAB 0044-2313 266, 281 (1951). 10.1002/zaac.19512660602
- (1951) Z. Anorg. Allg. Chem. , vol.266 , pp. 281
- Bues, W.¹ Wartenberg, H.V.²

2
- 33947455109
- JACSAT 0002-7863. 10.1021/ja01142a056
- W. L. Jolly and W. M. Latimer, J. Am. Chem. Soc. JACSAT 0002-7863 74, 5757 (1952). 10.1021/ja01142a056
- (1952) J. Am. Chem. Soc. , vol.74 , pp. 5757
- Jolly, W.L.¹ Latimer, W.M.²

3
- 0037856203
- JESOAN 0013-4651. 10.1149/1.2428524
- J. T. Law and P. S. Meigs, J. Electrochem. Soc. JESOAN 0013-4651 104, 154 (1957). 10.1149/1.2428524
- (1957) J. Electrochem. Soc. , vol.104 , pp. 154
- Law, J.T.¹ Meigs, P.S.²

4
- 0008917498
- APPLAB 0003-6951. 10.1063/1.126309
- K. Prabhakaran, F. Maeda, Y. Watanabe, and T. Ogino, Appl. Phys. Lett. APPLAB 0003-6951 76, 2244 (2000). 10.1063/1.126309
- (2000) Appl. Phys. Lett. , vol.76 , pp. 2244
- Prabhakaran, K.¹ Maeda, F.² Watanabe, Y.³ Ogino, T.⁴

5
- 48249137791
- JJAPA5 0021-4922. 10.1143/JJAP.47.2349
- K. Kita, S. Suzuki, H. Nomura, T. Takahashi, T. Nishimura, and A. Toriumi, Jpn. J. Appl. Phys. JJAPA5 0021-4922 47, 2349 (2008). 10.1143/JJAP.47.2349
- (2008) Jpn. J. Appl. Phys. , vol.47 , pp. 2349
- Kita, K.¹ Suzuki, S.² Nomura, H.³ Takahashi, T.⁴ Nishimura, T.⁵ Toriumi, A.⁶

6
- 31844456508
- Electrical characterization of germanium oxide/germanium interface prepared by electron-cyclotron-resonance plasma irradiation
- DOI 10.1143/JJAP.44.6981
- Y. Fukuda, T. Ueno, S. Hirono, and S. Hashimoto, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 44, 6981 (2005). 10.1143/JJAP.44.6981 (Pubitemid 43183050)
- (2005) Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers , vol.44 , Issue.9 B , pp. 6981-6984
- Fukuda, Y.¹ Ueno, T.² Hirono, S.³ Hashimoto, S.⁴

7
- 71749083157
- JAPIAU 0021-8979. 10.1063/1.3259407
- M. Kobayashi, G. Thareja, M. Ishibashi, Y. Sun, P. Griffin, J. McVittie, P. Pianetta, K. Saraswat, and Y. Nishi, J. Appl. Phys. JAPIAU 0021-8979 106, 104117 (2009). 10.1063/1.3259407
- (2009) J. Appl. Phys. , vol.106 , pp. 104117
- Kobayashi, M.¹ Thareja, G.² Ishibashi, M.³ Sun, Y.⁴ Griffin, P.⁵ McVittie, J.⁶ Pianetta, P.⁷ Saraswat, K.⁸ Nishi, Y.⁹

8
- 65949085352
- APPLAB 0003-6951. 10.1063/1.3143627
- T. Hosoi, K. Kutsuki, G. Okamoto, M. Saito, T. Shimura, and H. Watanabe, Appl. Phys. Lett. APPLAB 0003-6951 94, 202112 (2009). 10.1063/1.3143627
- (2009) Appl. Phys. Lett. , vol.94 , pp. 202112
- Hosoi, T.¹ Kutsuki, K.² Okamoto, G.³ Saito, M.⁴ Shimura, T.⁵ Watanabe, H.⁶

9
- 33847119423
- Role of germanium nitride interfacial layers in Hf O2 /germanium nitride/germanium metal-insulator-semiconductor structures
- DOI 10.1063/1.2679941
- T. Maeda, M. Nishizawa, Y. Morita, and S. Takagi, Appl. Phys. Lett. APPLAB 0003-6951 90, 072911 (2007). 10.1063/1.2679941 (Pubitemid 46280715)
- (2007) Applied Physics Letters , vol.90 , Issue.7 , pp. 072911
- Maeda, T.¹ Nishizawa, M.² Morita, Y.³ Takagi, S.⁴

10
- 33947317756
- Electrical properties of germanium/metal-oxide gate stacks with atomic layer deposition grown hafnium-dioxide and plasma-synthesized interface layers
- DOI 10.1063/1.2472197
- T. Sugawara, Y. Oshima, R. Sreenivasan, and P. C. Mclntyre, Appl. Phys. Lett. APPLAB 0003-6951 90, 112912 (2007). 10.1063/1.2472197 (Pubitemid 46439820)
- (2007) Applied Physics Letters , vol.90 , Issue.11 , pp. 112912
- Sugawara, T.¹ Oshima, Y.² Sreenivasan, R.³ McIntyre, P.C.⁴

11
- 17444437794
- Effects of elastic-electron scattering on measurements of silicon dioxide film thicknesses by X-ray photoelectron spectroscopy
- DOI 10.1016/S0368-2048(00)00254-1
- C. J. Powell and A. Jablonski, J. Electron Spectrosc. Relat. Phenom. JESRAW 0368-2048 114-116, 1139 (2001). 10.1016/S0368-2048(00)00254-1 (Pubitemid 32264034)
- (2001) Journal of Electron Spectroscopy and Related Phenomena , vol.114-116 , pp. 1139-1143
- Powell, C.J.¹ Jablonski, A.²

12
- 76549093053
- ECSTF8 1938-5862 (). 10.1149/1.3122088
- K. Kita, C. H. Lee, T. Nishimura, K. Nagashio, and A. Toriumi, ECS Trans. ECSTF8 1938-5862 19 (2), 101 (2009). 10.1149/1.3122088
- (2009) ECS Trans. , vol.19 , Issue.2 , pp. 101
- Kita, K.¹ Lee, C.H.² Nishimura, T.³ Nagashio, K.⁴ Toriumi, A.⁵

13
- 3342922631
- PRLTAO 0031-9007. 10.1103/PhysRevLett.55.2332
- R. Tromp, G. W. Rubloff, M. Liehr, and D. R. Young, Phys. Rev. Lett. PRLTAO 0031-9007 55, 2332 (1985). 10.1103/PhysRevLett.55.2332
- (1985) Phys. Rev. Lett. , vol.55 , pp. 2332
- Tromp, R.¹ Rubloff, G.W.² Liehr, M.³ Young, D.R.⁴

14
- 77954209223
- JAPIAU 0021-8979
- S. T. Ahn, H. W. Kennel, W. A. Tiller, and J. D. Plummer, J. Appl. Phys. JAPIAU 0021-8979 65, 2857 (1989).
- (1989) J. Appl. Phys. , vol.65 , pp. 2857
- Ahn, S.T.¹ Kennel, H.W.² Tiller, W.A.³ Plummer, J.D.⁴

15
- 85088335531
- MRSPDH 0272-9172
- Y. Kamata, A. Takashima, and T. Tezuka, Mater. Res. Soc. Symp. Proc. MRSPDH 0272-9172 1155, 04 (2009).
- (2009) Mater. Res. Soc. Symp. Proc. , vol.1155 , pp. 04
- Kamata, Y.¹ Takashima, A.² Tezuka, T.³

16
- 33947454094
- 10.1021/ja01153a018
- R. B. Bernstein and D. Cubicciotti, J. Am. Chem. 73, 4112 (1951). 10.1021/ja01153a018
- (1951) J. Am. Chem. , vol.73 , pp. 4112
- Bernstein, R.B.¹ Cubicciotti, D.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.