Defects in a nitrogen-implanted ZnO thin film

Physica Status Solidi (B) Basic Research

Volumn 247, Issue 5, 2010, Pages 1220-1226

  Schmidt, Matthias ^a   Ellguth, Martin ^a   Schmidt, Florian ^a   Lüder, Thomas ^a,c   Wenckstern, Holger V ^a   Pickenhain, Rainer ^a   Grundmann, Marius ^a   Brauer, Gerhard ^b   Skorupa, Wolfgang ^b  

^a UNIVERSITY OF LEIPZIG   (Germany)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^c UNIVERSITY OF KONSTANZ   (Germany)

Author keywords

Capacitance; Deep level defects; Ion implantation; ZnO

Indexed keywords

EID: 77954187170     PISSN: 03701972     EISSN: 15213951     Source Type: Journal    
DOI: 10.1002/pssb.200945534     Document Type: Article

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