Effect of deposition potential on the physical properties of electrodeposited CuO thin films

Journal of Optoelectronics and Advanced Materials

Volumn 12, Issue 6, 2010, Pages 1327-1332

  Mahalingam, T ^a   Dhanasekaran, V ^a   Ravi, G ^a   Lee, Soonil ^a,b   Chu, J P ^a,c   Lim, Han Jo ^a,b  

^a ALAGAPPA UNIVERSITY   (India)

^b Ajou University   (South Korea)

^c NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

CuO thin films; Electrodeposition; Growth kinetics; Microstructural parameters; Optical constants; Structural studies; Surface morphology

Indexed keywords

COPPER OXIDES; CRYSTALLITE SIZE; ELECTRODEPOSITION; ELECTRODES; FILM PREPARATION; GRAIN SIZE AND SHAPE; GROWTH KINETICS; LIGHT ABSORPTION; MORPHOLOGY; OPTICAL CONSTANTS; OXIDE FILMS; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; STRUCTURAL PROPERTIES; SURFACE MORPHOLOGY; THIN FILMS; X RAY DIFFRACTION;

CUO THIN FILMS; ELECTRODEPOSITION TECHNIQUE; EXTINCTION COEFFICIENT (K); MICRO-STRUCTURAL PROPERTIES; MICROSTRUCTURAL PARAMETERS; OPTICAL ABSORPTION TECHNIQUES; STRUCTURAL STUDIES; X-RAY DIFFRACTION STUDIES;

OPTICAL FILMS;

EID: 77954012375     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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