Characterization of electroplated FeSe thin films

Journal of Materials Science: Materials in Electronics

Volumn 20, Issue 8, 2009, Pages 727-734

  Thanikaikarasan, S ^a   Mahalingam, T ^a   Raja, M ^a   Kim, Taekyu ^b   Kim, Yong Deak ^c  

^a ALAGAPPA UNIVERSITY   (India)

^b University of Arizona   (United States)

^c Ajou University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BATH TEMPERATURES; CONDUCTING GLASS; DEPOSITED FILMS; DEPOSITION POTENTIAL; MICROSTRUCTURAL PARAMETERS; OPTICAL ABSORPTION TECHNIQUES; PREFERENTIAL ORIENTATION; SELENIDE; SOLUTION PH; X-RAY LINE PROFILE ANALYSIS;

CONDUCTIVE FILMS; OPTICAL MICROSCOPY; OXIDE FILMS; PH EFFECTS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TIN;

X RAY DIFFRACTION ANALYSIS;

EID: 67349210319     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-008-9794-y     Document Type: Article

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