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Volumn 33, Issue 2, 2010, Pages 103-110

Microstructural characterizations and hardness evaluation of d.c. reactive magnetron sputtered CrN thin films on stainless steel substrate

Author keywords

CrN thin films; Magnetron sputtering; Microhardness; Microstructural characterization

Indexed keywords

CHROMIUM NITRIDE; COMBINED EFFECT; CRN THIN FILMS; FILM DENSITY; GRAIN SIZE; MICRO-STRUCTURAL CHARACTERIZATION; MICROSTRUCTURAL CHARACTERISTICS; PREFERRED ORIENTATIONS; PROCESS PARAMETERS; REACTIVE MAGNETRON SPUTTERING; SEM; SPUTTERING CONDITIONS; SPUTTERING PROCESS; STAINLESS STEEL SUBSTRATES; SUBSTRATE TEMPERATURE; WORKING PRESSURES;

EID: 77953813347     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12034-010-0014-z     Document Type: Article
Times cited : (22)

References (23)
  • 5
    • 0003427458 scopus 로고
    • ed. M Cohen California: Addison Wesley Publishing Co. Inc.
    • Cullity B D 1977 Elements of X-ray diffraction 2/e (ed.) M Cohen (California: Addison Wesley Publishing Co. Inc.) p. 284
    • (1977) Elements of X-ray Diffraction 2/e , pp. 284
    • Cullity, B.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.