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Volumn 33, Issue 2, 2010, Pages 103-110
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Microstructural characterizations and hardness evaluation of d.c. reactive magnetron sputtered CrN thin films on stainless steel substrate
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Author keywords
CrN thin films; Magnetron sputtering; Microhardness; Microstructural characterization
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Indexed keywords
CHROMIUM NITRIDE;
COMBINED EFFECT;
CRN THIN FILMS;
FILM DENSITY;
GRAIN SIZE;
MICRO-STRUCTURAL CHARACTERIZATION;
MICROSTRUCTURAL CHARACTERISTICS;
PREFERRED ORIENTATIONS;
PROCESS PARAMETERS;
REACTIVE MAGNETRON SPUTTERING;
SEM;
SPUTTERING CONDITIONS;
SPUTTERING PROCESS;
STAINLESS STEEL SUBSTRATES;
SUBSTRATE TEMPERATURE;
WORKING PRESSURES;
ATOMIC FORCE MICROSCOPY;
CHARACTERIZATION;
CHROMIUM;
MAGNETRON SPUTTERING;
MICROHARDNESS;
NITRIDES;
PRESSURE EFFECTS;
SCANNING ELECTRON MICROSCOPY;
STAINLESS STEEL;
SURFACE TOPOGRAPHY;
THIN FILMS;
VAPOR DEPOSITION;
X RAY DIFFRACTION;
X RAY POWDER DIFFRACTION;
TOPOGRAPHY;
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EID: 77953813347
PISSN: 02504707
EISSN: None
Source Type: Journal
DOI: 10.1007/s12034-010-0014-z Document Type: Article |
Times cited : (22)
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References (23)
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