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Volumn 86-87, Issue PART 1, 1996, Pages 254-262
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Comparative study of mechanical and structural properties of CrN films deposited by d.c. magnetron sputtering and vacuum arc evaporation
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Author keywords
Chromium nitride; Magnetron sputtering; Vacuum arc evaporation
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Indexed keywords
CRYSTAL STRUCTURE;
EVAPORATION;
FILM GROWTH;
HARDNESS;
MAGNETRON SPUTTERING;
RESIDUAL STRESSES;
THERMAL EFFECTS;
VACUUM APPLICATIONS;
WEAR RESISTANCE;
CHROMIUM NITRIDE COATINGS;
GROWTH MECHANISM;
MACROSCOPIC FILM STRESS;
MICROHARDNESS;
SUBSTRATE BIAS VOLTAGE;
SUBSTRATE TEMPERATURE;
VACUUM ARC EVAPORATION;
PROTECTIVE COATINGS;
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EID: 0030383010
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(96)02951-9 Document Type: Article |
Times cited : (76)
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References (20)
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