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Volumn 86-87, Issue PART 1, 1996, Pages 254-262

Comparative study of mechanical and structural properties of CrN films deposited by d.c. magnetron sputtering and vacuum arc evaporation

Author keywords

Chromium nitride; Magnetron sputtering; Vacuum arc evaporation

Indexed keywords

CRYSTAL STRUCTURE; EVAPORATION; FILM GROWTH; HARDNESS; MAGNETRON SPUTTERING; RESIDUAL STRESSES; THERMAL EFFECTS; VACUUM APPLICATIONS; WEAR RESISTANCE;

EID: 0030383010     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)02951-9     Document Type: Article
Times cited : (76)

References (20)
  • 10
    • 0041606188 scopus 로고    scopus 로고
    • J.L. Vossen and W. Kern (eds.), Ch. 115
    • P.C. Johnson, in J.L. Vossen and W. Kern (eds.), Thin Films Processes II, Ch. 115, p. 209.
    • Thin Films Processes II , pp. 209
    • Johnson, P.C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.