Study of physical properties of integrated ferroelectric/ferromagnetic heterostructures

Journal of Applied Physics

Volumn 107, Issue 11, 2010, Pages

  Martinez R ^a   Kumar, A ^a   Palai, R ^a   Katiyar, R S ^a   Scott, J F ^b  

^a UNIVERSITY OF PUERTO RICO   (Puerto Rico)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ASYMMETRIC BEHAVIORS; CAPACITANCE VOLTAGE; CONSTITUTIVE LAYER; CRYSTALLINITIES; DIELECTRIC ANOMALY; DIELECTRIC CONSTANTS; FERROELECTRIC BEHAVIOR; FERROELECTRIC PROPERTY; FERROMAGNETIC BEHAVIORS; FERROMAGNETIC-PARAMAGNETIC; FREQUENCY-DEPENDENT; HETEROSTRUCTURES; HIGH STRAINS; INTERFACIAL EFFECTS; MAGNETIC NATURE; MGO SUBSTRATE; TANGENT LOSS; TIO;

BARIUM; FERROMAGNETIC MATERIALS; FERROMAGNETISM; MAGNETIC PROPERTIES; MANGANESE OXIDE; PULSED LASER DEPOSITION; PULSED LASERS;

FERROELECTRICITY;

EID: 77953644577     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3437627     Document Type: Article

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