Principles of dual-beam low-energy electron microscopy

Advances in Imaging and Electron Physics

Volumn 161, Issue C, 2010, Pages 1-53

  Mankos, Marian ^a,c   Spasov, Vassil ^a   Munro, Eric ^b  

^a KLA TENCOR CORPORATION   (United States)

^b MEBS Ltd   (United Kingdom)

^c Electron Optica   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELECTRON GUNS; ELECTRON MICROSCOPES; ELECTROSTATIC LENSES; LASER BEAM EFFECTS; LASER BEAMS; MAGNETIC FIELDS; OPTICAL INSTRUMENT LENSES;

CHARGING EFFECT; ELECTRON OPTICAL COMPONENTS; GLANCING INCIDENCE; LOW ENERGY ELECTRON MICROSCOPES; LOW ENERGY ELECTRON MICROSCOPY; OBJECTIVE LENS; SUBSTANTIAL REDUCTION; TOPOGRAPHIC FEATURES;

ELECTRONS;

EID: 77953607049     PISSN: 10765670     EISSN: None     Source Type: Book Series    
DOI: 10.1016/s1076-5670(10)61001-4     Document Type: Article

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