Electron-electron interactions in multibeam lithography columns

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2566-2571

  Mankos, M ^a,b   Sagle, A ^a   Coyle, S T ^a   Fernandez, A ^a,c  

^a APPLIED MATERIALS INC   (United States)

^b KLA TENCOR CORPORATION   (United States)

^c Glimmerglass Networks   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; ERROR ANALYSIS; MONTE CARLO METHODS; PHOTOCATHODES; PHOTOEMISSION; SUBSTRATES;

ELECTRON ELECTRON INTERACTIONS; LINEAR ARRAY SIZE; MULTIBEAM LITHOGRAPHY COLUMNS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035519107     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1420200     Document Type: Article

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