Electron-electron interactions in cathode objective lenses

Ultramicroscopy

Volumn 93, Issue 3-4, 2002, Pages 347-354

  Mankos, M ^a   Adler, D ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

Beam blur; Boersch effect; Cathode lenses; Electron electron interaction

Indexed keywords

CATHODES; CURRENT DENSITY; ELECTRON BEAMS; ELECTRON OPTICS; ELECTROSTATICS;

BEAM CURRENTS;

MAGNETIC LENSES;

ARTICLE; CALCULATION; ELECTRIC CURRENT; ELECTRICITY; ELECTRON; ELECTRON BEAM; ELECTRON MICROSCOPE; ELECTRON MICROSCOPY; EVALUATION; IMAGING SYSTEM; MAGNETIC FIELD; OPTICAL INSTRUMENTATION;

EID: 0036891398     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(02)00290-5     Document Type: Article

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