Raman spectroscopic study of femtosecond laser-induced phase transformation associated with ripple formation on single-crystal SiC

Applied Physics A: Materials Science and Processing

Volumn 99, Issue 1, 2010, Pages 23-27

  Yamaguchi, Makoto ^a   Ueno, Shigeru ^a   Kumai, Ryota ^b   Kinoshita, Keita ^b   Murai, Toshiaki ^b   Tomita, Takuro ^b   Matsuo, Shigeki ^b   Hashimoto, Shuichi ^b  

^a HOSEI UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS PHASIS; FEMTO-SECOND LASER; FEMTOSECOND LASER IRRADIATION; INTENSITY RATIO; PHYSICAL PROCESS; RAMAN SPECTROSCOPIC STUDY; RIPPLE FORMATION; RIPPLE STRUCTURE; SINGLE CRYSTAL SILICON; STRUCTURAL CHANGE;

AMORPHOUS CARBON; CRYSTAL STRUCTURE; PULSED LASER APPLICATIONS; RAMAN SPECTROSCOPY; SILICON CARBIDE; SPECTROSCOPIC ANALYSIS; ULTRASHORT PULSES;

AMORPHOUS SILICON;

EID: 77953537511     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-010-5569-4     Document Type: Article

References (26)

1. A. Köck, W. Beinstingl, K. Berthoid, E. Gornik, Appl. Phys. Lett. 52, 1164 (1988).
2. A. Blatter, M. Maillat, S.M. Pimenov, G.A. Shafeevc, A.V. Simakin, Tribol. Lett. 4, 237 (1998).
3. M. Birnbaum, J. Appl. Phys. 36, 3688 (1965).
4. J.E. Sipe, J.F. Young, J.S. Perston, H.M. Driel, Phys. Rev. B 27, 1141 (1983).
5. J.F. Young, J.S. Preston, H.M. Driel, J.E. Sipe, Phys. Rev. B 27, 1155 (1983).
6. J.F. Young, J.E. Sipe, H.M. Driel, Phys. Rev. B 30, 2001 (1984).
7. N. Yasumaru, K. Miyazaki, J. Kiuchi, Appl. Phys. A 76, 983 (2003).
8. F. Costache, M. Henyk, J. Reif, Appl. Surf. Sci. 208-209, 486 (2003).
9. A. Borowiec, H.K. Haugen, Appl. Phys. Lett. 82, 4462 (2003).
10. J. Bonse, M. Munz, H. Sturm, J. Appl. Phys. 97, 013538 (2005).
11. J. Reif, F. Costache, M. Henyk, S. Pandelov, Appl. Surf. Sci. 197-198, 891 (2002).
12. A.M. Ozkan, A.P. Malshe, T.A. Railkar, W.D. Brown, M.D. Shirk, P.A. Molian, Appl. Phys. Lett. 75, 3716 (1999).
13. Y. Shimotsuma, P. Kazansky, J. Qiu, K. Hirao, Phys. Rev. Lett. 91, 247405 (2003).
14. P. Rudolph, W. Kautek, Thin Solid Films 453-454, 537 (2004).
15. F. Costache, S.K. Arguirova, J. Reif, Appl. Phys. A 79, 1429 (2004).
16. J. Bonse, K.W. Brzezinka, A.J. Meixner, Appl. Surf. Sci. 221, 215 (2004).
17. A.P. Singh, A. Kapoor, K.N. Tripathi, G.R. Kumar, Opt. Laser Technol. 34, 37 (2002).
18. J. Reif, F. Costache, M. Bestehorn, in Recent Advances in Laser Processing of Materials, ed. by J. Perriere, E. Millon, E. Fogarassy (Elsevier, Amsterdam, 2006), pp. 275-290, Chap. 9.
19. T. Tomita, K. Kinoshita, S. Matsuo, S. Hashimoto, Jpn. J. Appl. Phys. 45, L444 (2006).
20. S. Nakashima, H. Harima, Phys. Status Solidi A 162, 39 (1997).
21. T. Tomita, S. Saito, M. Baba, M. Hundhausen, T. Suemoto, S. Nakashima, Phys. Rev. B 62, 12896 (2000).
22. S. Nakashima, H. Harima, T. Tomita, T. Suemoto, Phys. Rev. B 62, 16605 (2000).
23. M. Havel, D.B. Colomban, J. Mater. Sci. 39, 6183 (2004).
24. Y. Inoue, S. Nakashima, A. Mitsuishi, Solid State Commun. 48, 1071 (1983).
25. T.Q. Jia, F.L. Zhao, M. Huang, H.X. Chen, J.R. Qiu, R.X. Li, Z.Z. Xu, H. Kuroda, Appl. Phys. Lett. 88, 111117 (2006).
26. T. Tomital, R. Kumai, K. Kinoshita, S. Matsuo, S. Hashimoto, H. Nagase, M. Nakajima, T. Suemoto, Mater. Sci. Forum 600- 603, 879 (2009).