Method for the characterization of extreme-ultraviolet photoresist outgassing

Journal of Research of the National Institute of Standards and Technology

Volumn 114, Issue 3, 2009, Pages 179-183

  Tarrio, Charles ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Contamination; Extreme ultraviolet; Outgassing; Photoresist; Vacuum.

Indexed keywords

CONTAMINATION; DEGASSING; GAS CHROMATOGRAPHY; LIQUID CHROMATOGRAPHY; MASS SPECTROMETRY; MOLECULES; NITROGEN; VACUUM;

COATED OPTICS; COMPACT SYSTEM; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET RADIATIONS; ORGANIC MOLECULES; PRESSURE RISE METHOD; RELATIVE ABUNDANCE; VACUUM CHAMBERS;

PHOTORESISTS;

EID: 68349095249     PISSN: 1044677X     EISSN: None     Source Type: Journal    
DOI: 10.6028/jres.114.011     Document Type: Article

References (8)

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