Measurement of resist transmittance at extreme ultraviolet wavelength using the extreme ultraviolet reflectometer

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 A, 2002, Pages 4027-4030

  Irie, Shigeo ^a,b   Endo, Masayuki ^a,b   Sasago, Masaru ^a,b   Kandaka, Noriaki ^a,b   Kondo, Hiroyuki ^a,b   Murakami, Katsuhiko ^a,b  

^a PANASONIC CORPORATION   (Japan)

^b NIKON CORPORATION   (Japan)

Author keywords

Absorption; EUV lithography; EUV reflectometer; Laser plasma X ray source; Resist; Transmittance

Indexed keywords

CARBON DIOXIDE; MATHEMATICAL MODELS; MIRRORS; PLASMAS; POLYMETHYL METHACRYLATES; REFLECTION; REFLECTOMETERS; SEMICONDUCTOR DEVICE MANUFACTURE; ULTRAVIOLET INSTRUMENTS;

EXTREME ULTRAVIOLET LITHOGRAPHY; EXTREME ULTRAVIOLET REFLECTOMETER; LASER PLASMA X RAY SOURCE; RESIST TRANSMITTANCE MEASUREMENT;

PHOTOLITHOGRAPHY;

EID: 0036614746     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4027     Document Type: Article

References (8)