Development progress of optics for extreme ultraviolet lithography at Nikon

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 4, 2009, Pages

  Murakami, Katsuhiko ^a   Oshino, Tetsuya ^a   Kondo, Hiroyuki ^a   Shiraishi, Masayuki ^a   Chiba, Hiroshi ^a   Komatsuda, Hideki ^a   Nomura, Kazushi ^a   Nishikawa, Jin ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Aspheric mirrors; Extreme ultraviolet lithography; Illumination optics; Multilayer coatings; Projection optics

Indexed keywords

COATINGS; LITHOGRAPHY; MIRRORS; MULTILAYERS; ULTRAVIOLET DEVICES; EXTREME ULTRAVIOLET LITHOGRAPHY;

ASPHERIC MIRRORS; COHERENCE FACTORS; EXPOSURE TOOL; EXTREME ULTRAVIOLETS; FULL-FIELD; HIGH NA; ILLUMINATION OPTICS; LINE-AND-SPACE PATTERNS; MULTILAYER COATINGS; NUMERICAL APERTURE; PARTIAL COHERENT; PROJECTION OPTICS; RESOLUTION ENHANCEMENT TECHNOLOGY; SPECTRAL PURITY; WAVEFRONT ERRORS; EXTREME ULTRAVIOLET;

EXTREME ULTRAVIOLET LITHOGRAPHY; OPTICS;

EID: 70349895731     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3238522     Document Type: Article

References (6)

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