Intra-field CD variation by stray light from neighboring field

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1412-1420

  Lim, Chang Moon ^a   Song, Jung Ho ^a   Woo, Soung Su ^a   Kwon, Ki Sung ^a   Ahn, Chang Nam ^a   Shin, Ki Soo ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

Adjacent field; Flare; Intra field CD variation; Neighboring field; Photolithography; Stray light

Indexed keywords

KRYPTON; LIGHT MEASUREMENT; MASKS; SCANNING;

STRAY LIGHT;

LITHOGRAPHY;

EID: 0036416499     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474525     Document Type: Conference Paper

References (4)

1. E. Luce, et. al., "Flare impact on the intra-field CD control for sub-0.25μm patterning", Proc. SPIE Vol. 3679, pp368-81, 1999.
2. A. Bourov, L. Litt, and L. Zavyalova, "Impact of flare on CD variation for 248nm and 193mn lithography systems", Proc. SPIE Vol. 4346, pp1388-93, 2001.
3. K. Lai, C. Wu, and C. Progler, "Scattered light: the increasing problem for 193nm exposure tools and beyond", proc. SPIE Vol. 4346, pp1424-35, 2001.
4. J. Kirk, "Scattered light in photolithographic lenses", Proc. SPIE Vol2197, pp.566-73, 1994.