Optical and electrical properties of Y 2 O 3 thin films prepared by ion beam assisted deposition

Applied Surface Science

Volumn 256, Issue 20, 2010, Pages 5832-5836

  Leng, Jian ^a   Yu, Zhinong ^a   Li, Yuqiong ^a   Zhang, Dongpu ^a   Liao, Xiaoyi ^a   Xue, Wei ^a  

^a BEIJING INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Electrical properties; Ion beam assisted deposition (IBAD); Optical properties; Y 2 O 3

Indexed keywords

ELECTRIC PROPERTIES; FILM PREPARATION; ION BEAMS; ION BOMBARDMENT; IONS; LIGHT ABSORPTION; OPTICAL FILMS; OPTICAL PROPERTIES; REFRACTIVE INDEX; SUBSTRATES; SUPERCONDUCTING FILMS; THIN FILMS;

ELECTRICAL BREAKDOWN STRENGTHS; FABRICATION PARAMETERS; FILM CRYSTALLINITY; ION BEAM BOMBARDMENT; OPTICAL AND ELECTRICAL PROPERTIES; RELATIVE DIELECTRIC CONSTANT; SUBSTRATE TEMPERATURE; Y2O3;

ION BEAM ASSISTED DEPOSITION;

EID: 77953231997     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.03.054     Document Type: Article

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