Effect of sample configuration on droplet-particles of TiN films deposited by pulse biased arc ion plating

Journal of Materials Science and Technology

Volumn 25, Issue 5, 2009, Pages 681-686

  Zhao, Yanhui ^a   Lin, Guoqiang ^b   Xiao, Jinquan ^a   Dong, Chuang ^b   Wen, Lishi ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

^b DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Arc ion plating; Droplet particles; Pulsed bias; TiN film

Indexed keywords

ARC ION PLATING; DROPLET-PARTICLES; DUTY CYCLES; ION DEPOSITION; NEGATIVE PULSE; ORTHOGONAL EXPERIMENT; PHYSICAL MODEL; PLASMA FLUXES; PULSE BIASED ARC ION PLATINGS; PULSE FREQUENCIES; PULSED BIAS; STAINLESS STEEL SUBSTRATES; TIN FILM; TIN FILMS;

CAVITY RESONATORS; DROP FORMATION; ELECTRIC ARCS; ELECTRIC FIELDS; METALLIC FILMS; PLASMA DEPOSITION; PLATING; SIZE DISTRIBUTION; STAINLESS STEEL; TITANIUM COMPOUNDS; TITANIUM NITRIDE;

ION IMPLANTATION;

EID: 70350583392     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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