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Volumn 55, Issue 18, 2010, Pages 5210-5222

Numerical simulation of probing the electric double layer by scanning electrochemical potential microscopy

Author keywords

Debye screening; EDL overlap; Electric double layer; Scanning probe microscopy; SECPM

Indexed keywords

CHARGED SURFACES; COMPUTATIONAL MODELING; DEBYE SCREENING; DILUTE SOLUTION; EDL OVERLAP; ELECTRIC DOUBLE LAYER; ELECTROCHEMICAL POTENTIAL; ELECTROLYTE SOLUTIONS; ION SIZE; IONIC DISTRIBUTION; NUMERICAL SIMULATION; OPEN CIRCUIT POTENTIAL; POISSON-BOLTZMANN EQUATIONS; POTENTIAL PROFILES; STERIC EFFECT;

EID: 77953132413     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2010.04.042     Document Type: Article
Times cited : (15)

References (70)
  • 4
    • 77953137495 scopus 로고    scopus 로고
    • Scanning electrochemical potential microscopy,
    • US Patent No, US 7.156.965 B1, Veeco Instrument Inc, 2007
    • C. Li, K.J. Kjoller, Scanning electrochemical potential microscopy, US Patent No.: US 7.156.965 B1, Veeco Instrument Inc. (2007).
    • Li, C.1    Kjoller, K.J.2
  • 51
    • 77953137699 scopus 로고    scopus 로고
    • COMSOL, Burlington MA
    • ® Ltd., Burlington MA.
    • ® Ltd


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.