Double layer relaxation measurements using atomic force microscopy

Langmuir

Volumn 15, Issue 15, 1999, Pages 4935-4939

  Teschke, O ^a   De Souza, E F ^a   Ceotto, G ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFUSION; ELECTRIC FIELD EFFECTS; MICA; PERMITTIVITY; RELAXATION PROCESSES; SILICON NITRIDE; SUBSTRATES; SULFUR COMPOUNDS; WATER;

DIMETHYL SULFOXIDE;

PHASE INTERFACES;

EID: 0345633688     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la980843s     Document Type: Article

References (31)

1. Bowden, J. W.; Bolland, M. D. A.; Posner, A. M.; Quick, J. P. Nature Phys. Sci. 1973, 81, 245.
2. Dugger, D. L.; Stanton, J. H.; Irby, B. N.; McConnell, B. L.; Cummings, W. W.; Maatman, R. W. J. Phys. Chem. 1964, 68, 757.
3. Davis, J. A.; James, R. O.; Leckie, J. O. J. Colloid Interface Sci. 1978, 63, 480.
4. Weaver, D. W.; Feke, D. L. J. Colloid Interface Sci. 1985, 103, 267.
5. Frens, G.; Overbeek, J. T. G. J. Colloid Interface Sci. 1972, 38, 376.
6. Weise, G. R.; Healy, T. W. Trans. Faraday Soc. 1970, 66, 480.
7. Long, J. A.; Osmond, D. W.; Vincent, B. J. Colloid Interface Sci. 1973, 42, 545.
8. Spielman, L. A.; Friedlander, S. K. J. Colloid Interface Sci. 1974, 44, 22.
9. Prieve, D. C.; Ruckenstein, E. J. Colloid Interface Sci. 1976, 57, 547.
10. Small, H. J. Colloid Interface Sci. 1974, 48, 147.
11. DiMarzio, E. A.; Guttman, C. M. J. Polym. Sci. 1968, 137, 276.
12. Mandralis, Z. I.; Wernet, J. H.; Feke, D. L. J. Colloid Interface Sci. 1996, 182, 26.
13. Flicker, S. G.; Tipa, J. L.; Bike, S. G. J. Colloid Interface Sci. 1993, 158, 317.
14. Israelachvili, J. N.; Adams, G. E. J. Chem. Soc., Faraday Trans. 1 1978, 74, 975.
15. Israelachvili, J. N. Faraday Discuss. Chem. Soc. 1978, 65, 20.
16. Christenson, H. K. J. Chem. Soc., Faraday Trans. 1 1984, 80, 1933.
17. Israelachvili, J. N.; Tirrel, M.; Klein, J.; Almog, Y. Macromolecules 1984, 17, 204.
18. McGuiggan, P. M.; Israelachvili, J. N. J. Mater. Res. 1990, 5, 2232.
19. Teschke, O.; Douglas, R. A.; Prolla, T. A. Appl. Phys. Lett. 1997, 70, 1977.
20. Sassaki, R. M.; Douglas, R. A.; Kleinke, M. U.; Teschke, O. J. Vac. Sci. Technol. B 1996, 14, 432.
21. Nishimura, S.; Tateyama, H.; Tsunematsu, K.; Jinnai, K. J. Colloid Interface Sci. 1992, 152, 359.
22. Bergstrom, L.; Bostedt, E. Colloids Surf. A 1990, 49, 183.
23. Harane, D. L.; Bousse, L. J.; Shott, J. D.; Meindl, J. D. IEEE Trans. Electron Devices 1987, 34, 1700.
24. Drummond, C. J.; Senden, T. J. Colloids Surf. A 1994, 87, 217.
25. Sokolov, Y.; Henderson, G. S.; Wicks, F. J.; Ozin, G. A. Appl. Phys. Lett. 1997, 70, 844.
26. Teschke, O.; Souza, E. F. Rev. Sci. Instrum. 1998, 69, 3588.
27. Teschke, O.; Souza, E. F. Appl. Phys. Lett. 1998, 71, 3588.
28. Becker, R. Electromagnetic and Interactions; Dover: New York, 1964.
29. Bockris, J.; Reddy, A. Modern Electrochemistry; Plenum: New York, 1970.
30. Lyklema, J.; Dukhin, S. S.; Shilov, V. N. J. Electroanal. Chem. 1983, 1, 143.
31. Popovich, O.; Tomkins, R. P. T. Nonaqueous Solution Chemistry; John Wiley: New York, 1981.