Effect of doping and substrate temperature on the structural and optical properties of reactive pulsed laser ablated tin oxide doped tantalum oxide thin films

Vacuum

Volumn 84, Issue 10, 2010, Pages 1204-1211

  Krishnan, Renju R ^a   Nissamudeen, K M ^a   Gopchandran, K G ^a   Pillai, V P Mahadevan ^a   Ganesan, V ^b  

^a UNIVERSITY OF KERALA   (India)

^b UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH   (India)

Author keywords

Optical coatings; Pulsed laser deposition; Tantalum oxide; Tin oxide doping

Indexed keywords

AFM; AVERAGE SIZE; BAND GAPS; BAND-BENDING EFFECTS; BLUE SHIFT; BOND FORMATION; CRYSTALLINE NATURE; DEBYE-SCHERRER FORMULA; DIFFERENT SUBSTRATES; DOPED FILMS; EFFECT OF DOPING; FTIR; MICRO-RAMAN; OPTICAL TRANSMITTANCE; OXYGEN AMBIENT; PULSED LASER; QUARTZ SUBSTRATE; RAMAN ANALYSIS; ROOM TEMPERATURE; STRUCTURAL AND OPTICAL PROPERTIES; SUBSTRATE TEMPERATURE; UNDOPED FILMS; VIBRATIONAL BANDS;

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; CRYSTALLITE SIZE; DOPING (ADDITIVES); NANORODS; OPTICAL COATINGS; OPTICAL PROPERTIES; OXIDE FILMS; OXIDE MINERALS; OXYGEN; PULSED LASER DEPOSITION; PULSED LASERS; QUARTZ; RAMAN SPECTROSCOPY; SPECTROSCOPIC ANALYSIS; SUBSTRATES; TANTALUM; TANTALUM OXIDES; TIN; TITANIUM COMPOUNDS; ULTRAVIOLET SPECTROSCOPY;

OPTICAL FILMS;

EID: 77953127235     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.10.026     Document Type: Article

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