Use of high repetition rate and high power lasers in microfabrication: How to keep the efficiency high?

Journal of Laser Micro Nanoengineering

Volumn 4, Issue 3, 2009, Pages 186-191

  Račiukaitis, Gediminas ^a   Brikas, Marijus ^a   Gečys, Paulius ^a   Voisiat, Bogdan ^a   Gedvilas, Mindaugas ^a  

^a CENTER FOR PHYSICAL SCIENCES AND TECHNOLOGY   (Lithuania)

Author keywords

Ablation rate; Ablation threshold; Accumulation effects; Metals; Picosecond laser

Indexed keywords

ABLATION; HIGH POWER LASERS; LASER ABLATION; METALS; PULSE REPETITION RATE; SOLID STATE LASERS; ULTRAFAST LASERS; ULTRASHORT PULSES;

ABLATION RATES; ABLATION THRESHOLDS; ACCUMULATION EFFECTS; HIGH PULSE REPETITION RATE; HIGH REPETITION RATE; PICOSECOND LASER; PROCESSING ACCURACIES; REPETITION RATE LASERS;

LASER MATERIALS PROCESSING;

EID: 77953051041     PISSN: None     EISSN: 18800688     Source Type: Journal    
DOI: 10.2961/jlmn.2009.03.0008     Document Type: Article

References (21)

1. J. Konig, S. Nolte, A. Tunnermann, Plasma evolution during metal ablation with ultrashort laser pulses, Op-tics Express, 13, 10597-10607 (2005).
2. J. Furmanski, A.M. Rubenchik, M.D. Shirk and B.C. Stuart, J. Appl. Phys., 102, (2007) 073112.
3. J. Bonse, H. Sturm, D. Schmidt and W. Kautek, Appl. Phys. A71, (2000) 657.
4. S. Martin, A. Hertwig, M. Lenzner, J. Kruger andW. Kautek, Appl. Phys. A77, (2003) 883.
5. X. Mao, R.E. Russo, Appl. Phys. A64 (1997 1.
6. M.A. Shannon, X. Mao, R.E. Russo, Mat. Sci. Engi-neering, B45 (1997) 172.
7. J.M. Vadillo, J.M. Fernandez Homero, C. Rodeiguez, J.J. Laserna, Surf. Interface Anal., 27 (1999) 1009.
8. M. Weikert, Ch. Foehl and F. Dausinger, Proc. 3-rd Int. Symp. on Laser Precision Microfabrication, Proc. SPIE 4830, (2003) 501.
9. A. Cavalleri, K. Sokolowski-Tinten, J. Bialkowski, M. Schreiner and D. von der Linde, J. Appl. Phys. 85, (1999) 3301.
10. I.I. Beilis, Laser and Particle Beams, 25 (2007) 53.
11. M.H. Hong, Y.F. Lu, Appl. Phys. A69 (1999) S605.
12. J.M. Liu, Opt. Lett., 7, (1982) 196.
13. Y. Jee, M.F. Becker and R.M. Walser, J. Opt. Soc. Am. B, 5, (1988) 648.
14. H. Pantsar, P. Laakso and R. Penttilä, Proc. 4-th Int. WLT-conference on Laser in Manufacturing, LIM 2007, Munich, June 18-22, 2007, (2007) 613.
15. E.G. Gamaly, N.R. Madsen, M. Duering, A.V. Rode, V.Z. Kolev and B. Luther-Davies, Phys. Rev. B 71, (2005) 174405.
16. P.T. Mannion, J. Magee, E. Coyne, G.M. O'Connor and T.J. Glynn, Appl. Surf. Science, 233, (2004) 275.
17. D. Bauerle, Laser Processing and Chemistry, 3rd edi-tion, Springer (2001).
18. D. Breitling, A. Ruf and F. Dausinger, Proc. SPIE 5339, (2004) 49.
19. J.J. Chang, B.E. Warner, E.P. Dragon and M.W. Martinez, Journal of Laser Applications, 10, (1998) 285.
20. J. Hermann, C. Vivien, A.P. Carricato and C. Boulmer-Leborgne, Appl. Surf. Science, 127-129, (1998) 645.
21. A. Ancona, F. Roses, K. Rademaker, J. Limpert, S. Nolte, A. Tunnermann, Opt. Express 16 (2008) 8958.