Plasma diagnostics at early stage of laser ablation

Applied Physics A: Materials Science and Processing

Volumn 69, Issue 7, 1999, Pages

  Hong, M H ^a   Lu, Y F ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 7044242378     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390051486     Document Type: Article

References (10)

1. R.K. Singh, J. Narayan: Phys. Rev. B 41, 8843 (1990)
2. Y.F. Lu, Y. Aoyagi, M. Takai, S. Namba: Jpn. J. Appl. Phys. 33, 7138 (1994)
3. M.C. Gower: Laser Processing in Manufacturing (Chapman and Hall, London 1993)
4. J.C. Miller: Laser Ablation: Principles and Applications (Springer, New York 1994)
5. D. Buerle: Laser Processing and Chemistry (Springer, Berlin, Heidelberg 1996)
6. Q.Z. Qin, Z.H. Han, H.J. Dang: J. Appl. Phys. 83, 6082 (1998)
7. J.M. Hendron, C.M.O. Mahony, T. Morrow, W.G. Graham: J. Appl. Phys. 81, 2131 (1997)
8. X. Mao, R.E. Russo: Appl. Phys. A. 64, 1 (1997)
9. A. Cavalleri, K. Sokolowski-Tinten, J. Bialkowski, D. von der Linde: Appl. Phys. Lett. 72, 2385 (1998)
10. H.C. Ohanian: Classical Electrodynamics (Allyn & Bacon, London 1988)