Low-temperature, self-catalyzed growth of Si nanowires

Nanotechnology

Volumn 21, Issue 25, 2010, Pages

  Cuscunà, Massimo ^a   Convertino, Annalisa ^a   Mariucci, Luigi ^a   Fortunato, Guglielmo ^a   Felisari, Laura ^b   Nicotra, Giuseppe ^a   Spinella, Corrado ^a   Pecora, Alessandro ^a   Martelli, Faustino ^a  

^a CNR   (Italy)

^b IOM CNR LABORATORIO TASC   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SI; CHEMICAL TREATMENTS; CLEAVAGE PLANE; CRYSTALLINE CORE; GROWTH SURFACES; HIGH DENSITY; LASER ANNEALING; LOW TEMPERATURES; MICROCRYSTALLINE SI; REFLECTIVITY MEASUREMENTS; SELF-CATALYZED; SELF-CATALYZED GROWTH; SI (1 1 1); SI NANOWIRE; SI SUBSTRATES; SI(110);

NANOWIRES; SCANNING ELECTRON MICROSCOPY; SURFACE CHEMISTRY; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS SILICON;

EID: 77952992923     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/25/255601     Document Type: Article

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