Atomically sharp catalyst-free wurtzite GaAsAlGaAs nanoneedles grown on silicon

Applied Physics Letters

Volumn 93, Issue 2, 2008, Pages

  Moewe, Michael ^a   Chuang, Linus C ^a   Crankshaw, Shanna ^a   Chase, Chris ^a   Chang Hasnain, Connie ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; ELECTRIC WIRE; EPITAXIAL GROWTH; GALLIUM ALLOYS; ION BEAM ASSISTED DEPOSITION; METALLIZING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METALS; NANONEEDLES; NANOSTRUCTURES; NONMETALS; ORGANIC CHEMICALS; ORGANIC COMPOUNDS; SEMICONDUCTING GALLIUM; SILICON; VAPORS;

AMERICAN INSTITUTE OF PHYSICS (AIP); CATALYST-FREE; GROWTH TIME; METAL-ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); NANO NEEDLES; SELF-ASSEMBLED GROWTH; SI(2 1 1) SUBSTRATES; SINGLE-CRYSTAL WURTZITE; TAPER ANGLES; VAPOR-LIQUID-SOLID (VLS); WURTZITE (WZ);

VAPOR DEPOSITION;

EID: 47549091517     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2949315     Document Type: Article

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