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Volumn 107, Issue 10, 2010, Pages

Surface loss probabilities of H and N radicals on different materials in afterglow plasmas employing H2 and N2 mixture gases

(7) Moon, Chang Sung a Takeda, Keigo a Takashima, Seigo b Sekine, Makoto a,c Setsuhara, Yuichi c,d Shiratani, Masaharu c,e Hori, Masaru a,c

a NAGOYA UNIVERSITY (Japan)

b Nagoya Urban Industries Promotion Corporation (Japan)

c JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

d OSAKA UNIVERSITY (Japan)

e KYUSHU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AFTERGLOW PLASMAS; DECAY CURVES; HIGH PRESSURE; HOLLOW CATHODE LAMP; MICRODISCHARGES; PLASMA-SURFACE INTERACTIONS; QUANTITATIVE MEASUREMENT; RADICAL DENSITIES; SURFACE LOSS PROBABILITIES; VACUUM ULTRAVIOLET ABSORPTION SPECTROSCOPIES; VUV PHOTON; WALL MATERIALS;

ABSORPTION SPECTROSCOPY; GAS ABSORPTION; LIGHT SOURCES; MIXTURES; MULTIPHOTON PROCESSES; PHOTONS; PLASMA INTERACTIONS; PROBABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACES;

EID: 77952977187 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3372750 Document Type: Article

Times cited : (17)

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