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Volumn 34, Issue 1, 2002, Pages 456-459
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Thermal nitridation of ultrathin SiO2 on Si by NH3
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Author keywords
Diffusion; NH3; Nitridation; Segregation; Silicon dioxide; Silicon oxynitride
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Indexed keywords
AMMONIA;
CHEMICAL VAPOR DEPOSITION;
DIFFUSION;
ETCHING;
INTERFACES (MATERIALS);
NITRIDING;
NITROGEN;
SEMICONDUCTING SILICON;
SILICA;
SILICON NITRIDE;
TEMPERATURE MEASUREMENT;
X RAY PHOTOELECTRON SPECTROSCOPY;
LOW PRESSURE CHEMICAL VAPOR DEPOSITION;
SILICON OXYNITRIDE;
THERMAL NITRIDATION;
ULTRATHIN FILMS;
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EID: 0036693572
PISSN: 01422421
EISSN: None
Source Type: Journal
DOI: 10.1002/sia.1337 Document Type: Conference Paper |
Times cited : (27)
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References (7)
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