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Volumn 34, Issue 1, 2002, Pages 456-459

Thermal nitridation of ultrathin SiO2 on Si by NH3

Author keywords

Diffusion; NH3; Nitridation; Segregation; Silicon dioxide; Silicon oxynitride

Indexed keywords

AMMONIA; CHEMICAL VAPOR DEPOSITION; DIFFUSION; ETCHING; INTERFACES (MATERIALS); NITRIDING; NITROGEN; SEMICONDUCTING SILICON; SILICA; SILICON NITRIDE; TEMPERATURE MEASUREMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0036693572     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1337     Document Type: Conference Paper
Times cited : (27)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.