-
1
-
-
0030282352
-
Laminated high-aspect-ratio microstructures in a conventional CMOS process
-
G. Fedder, et al., “Laminated high-aspect-ratio microstructures in a conventional CMOS process,” Sens. Act. A Phys, 57, 103 (1996).
-
(1996)
Sens. Act. a Phys
, vol.57
, pp. 103
-
-
Fedder, G.1
-
2
-
-
0036143270
-
Flip-chip fabrication of advanced micromirror arrays
-
M. A. Michalicek, et al., “Flip-chip fabrication of advanced micromirror arrays,” Sens. Act. A, 95, 152 (2002).
-
(2002)
Sens. Act. A
, vol.95
, pp. 152
-
-
Michalicek, M.A.1
-
3
-
-
29244487535
-
Gimbal-less MEMS two-axis optical scanner array with high fill factor
-
J. Tsai, M. C. Wu, “Gimbal-less MEMS two-axis optical scanner array with high fill factor,” J. MEMS, 14, 1323 (2005).
-
(2005)
J. MEMS
, vol.14
, pp. 1323
-
-
Tsai, J.1
Wu, M.C.2
-
4
-
-
10944220860
-
Wafer-scale microdevice transfer/interconnect: Its application in an AFM-based data-storage system
-
M. Despont, et al., “Wafer-scale microdevice transfer/interconnect: Its application in an AFM-based data-storage system,” J. MEMS, 13, 895 (2004).
-
(2004)
J. MEMS
, vol.13
, pp. 895
-
-
Despont, M.1
-
5
-
-
33947243456
-
4 cantilever array on CMOS circuit for high density probe-based data storage
-
4 cantilever array on CMOS circuit for high density probe-based data storage,” Sens. Act. A, 135, 67 (2007).
-
(2007)
Sens. Act. A
, vol.135
, pp. 67
-
-
Kim, Y.1
-
6
-
-
4344565790
-
A two-axis electrothermal micromirror for endoscopic optical coherence tomography
-
A. Jain, et al., “A two-axis electrothermal micromirror for endoscopic optical coherence tomography,” IEEE J. Sel. Top. Quantum Electronics, 10, 636 (2004).
-
(2004)
IEEE J. Sel. Top. Quantum Electronics
, vol.10
, pp. 636
-
-
Jain, A.1
-
7
-
-
0029419192
-
Advanced silicon etching using high density plasmas
-
J. K. Bhardwaj, H. Ashraf, “Advanced silicon etching using high density plasmas,” Proc. SPIE 2639, 224 (1995).
-
(1995)
Proc. SPIE
, vol.2639
, pp. 224
-
-
Bhardwaj, J.K.1
Ashraf, H.2
-
9
-
-
0342906553
-
Depth and profile control in plasma etched MEMS structures
-
J. Kiihamäki, et al., “Depth and profile control in plasma etched MEMS structures,” Sens. Act. A, 82, 234 (2000).
-
(2000)
Sens. Act. A
, vol.82
, pp. 234
-
-
Kiihamäki, J.1
-
10
-
-
0036194607
-
Fabrication of out-of-plane curved surfaces in Si by utilizing RIE lag
-
Las Vegas, NV
-
T. A. Chou, K. Najafi, “Fabrication of out-of-plane curved surfaces in Si by utilizing RIE lag,” Tech. Digest 15th IEEE Int. Conf. on Microelectromechanical Systems, Las Vegas, NV, (2002), pp. 145-148.
-
(2002)
Tech. Digest 15Th IEEE Int. Conf. on Microelectromechanical Systems
, pp. 145-148
-
-
Chou, T.A.1
Najafi, K.2
-
11
-
-
85061929518
-
-
Tech. Dig. of the 2004 Solid-State Sensor, Actuator and Microsystems Workshop, Hilton Head Isl., SC, 6/6–10/2004, Transducer Research Foundation, Cleveland
-
T. F. Hill, et al., “Pattern density based prediction for deep reactive ion etch (DRIE),” Tech. Dig. of the 2004 Solid-State Sensor, Actuator and Microsystems Workshop, Hilton Head Isl., SC, 6/6–10/2004, Transducer Research Foundation, Cleveland (2004), pp. 320-323.
-
(2004)
Pattern Density Based Prediction for Deep Reactive Ion Etch (DRIE)
, pp. 320-323
-
-
Hill, T.F.1
-
12
-
-
0035450041
-
The application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS
-
B. E. Volland, et al., “The application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS,” Micro. Eng., 57-58, 641 (2001).
-
(2001)
Micro. Eng.
, vol.57-58
, pp. 641
-
-
Volland, B.E.1
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