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Volumn , Issue , 2008, Pages 10-13

Flip-chip integrated soi-cmos-mems fabrication technology

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CMOS INTEGRATED CIRCUITS; ELECTROSTATIC ACTUATORS; FABRICATION; MICROSYSTEMS; MIRRORS; SILICON ON INSULATOR TECHNOLOGY; SOLID-STATE SENSORS;

EID: 77952785241     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.31438/trf.hh2008.3     Document Type: Conference Paper
Times cited : (15)

References (12)
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  • 2
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    • Flip-chip fabrication of advanced micromirror arrays
    • M. A. Michalicek, et al., “Flip-chip fabrication of advanced micromirror arrays,” Sens. Act. A, 95, 152 (2002).
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    • Michalicek, M.A.1
  • 3
    • 29244487535 scopus 로고    scopus 로고
    • Gimbal-less MEMS two-axis optical scanner array with high fill factor
    • J. Tsai, M. C. Wu, “Gimbal-less MEMS two-axis optical scanner array with high fill factor,” J. MEMS, 14, 1323 (2005).
    • (2005) J. MEMS , vol.14 , pp. 1323
    • Tsai, J.1    Wu, M.C.2
  • 4
    • 10944220860 scopus 로고    scopus 로고
    • Wafer-scale microdevice transfer/interconnect: Its application in an AFM-based data-storage system
    • M. Despont, et al., “Wafer-scale microdevice transfer/interconnect: Its application in an AFM-based data-storage system,” J. MEMS, 13, 895 (2004).
    • (2004) J. MEMS , vol.13 , pp. 895
    • Despont, M.1
  • 5
    • 33947243456 scopus 로고    scopus 로고
    • 4 cantilever array on CMOS circuit for high density probe-based data storage
    • 4 cantilever array on CMOS circuit for high density probe-based data storage,” Sens. Act. A, 135, 67 (2007).
    • (2007) Sens. Act. A , vol.135 , pp. 67
    • Kim, Y.1
  • 6
    • 4344565790 scopus 로고    scopus 로고
    • A two-axis electrothermal micromirror for endoscopic optical coherence tomography
    • A. Jain, et al., “A two-axis electrothermal micromirror for endoscopic optical coherence tomography,” IEEE J. Sel. Top. Quantum Electronics, 10, 636 (2004).
    • (2004) IEEE J. Sel. Top. Quantum Electronics , vol.10 , pp. 636
    • Jain, A.1
  • 7
    • 0029419192 scopus 로고
    • Advanced silicon etching using high density plasmas
    • J. K. Bhardwaj, H. Ashraf, “Advanced silicon etching using high density plasmas,” Proc. SPIE 2639, 224 (1995).
    • (1995) Proc. SPIE , vol.2639 , pp. 224
    • Bhardwaj, J.K.1    Ashraf, H.2
  • 9
    • 0342906553 scopus 로고    scopus 로고
    • Depth and profile control in plasma etched MEMS structures
    • J. Kiihamäki, et al., “Depth and profile control in plasma etched MEMS structures,” Sens. Act. A, 82, 234 (2000).
    • (2000) Sens. Act. A , vol.82 , pp. 234
    • Kiihamäki, J.1
  • 11
    • 85061929518 scopus 로고    scopus 로고
    • Tech. Dig. of the 2004 Solid-State Sensor, Actuator and Microsystems Workshop, Hilton Head Isl., SC, 6/6–10/2004, Transducer Research Foundation, Cleveland
    • T. F. Hill, et al., “Pattern density based prediction for deep reactive ion etch (DRIE),” Tech. Dig. of the 2004 Solid-State Sensor, Actuator and Microsystems Workshop, Hilton Head Isl., SC, 6/6–10/2004, Transducer Research Foundation, Cleveland (2004), pp. 320-323.
    • (2004) Pattern Density Based Prediction for Deep Reactive Ion Etch (DRIE) , pp. 320-323
    • Hill, T.F.1
  • 12
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    • The application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS
    • B. E. Volland, et al., “The application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS,” Micro. Eng., 57-58, 641 (2001).
    • (2001) Micro. Eng. , vol.57-58 , pp. 641
    • Volland, B.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.