Flying phase mask for the printing of long submicron-period stitchingless gratings

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 734-737

  Gamet, E ^a   Jourlin, Y ^a   Pelissier, S ^a   Min, R ^a   Reynaud, S ^a   Veillas, C ^a   Pommier, J C ^a   Parriaux, O ^a  

^a UNIVERSITÉ JEAN MONNET   (France)

Author keywords

Grating; Optical lithography; Phase mask; Stitching

Indexed keywords

DIFFRACTION GRATINGS; LASER BEAMS; MICROELECTRONICS; PHOTOLITHOGRAPHY; PRINTING; REAL TIME SYSTEMS; SENSORS;

GRATING; GRATING SUBSTRATE; PHASE MASK; STITCHING;

MASKS;

EID: 33646071887     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.002     Document Type: Article

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