Resist trimming etch process control using dynamic scatterometry

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 1040-1042

  El kodadi, M ^a   Soulan, S ^a   Besacier, M ^a   Schiavone, P ^a,b  

^a Laboratoire des Technologies   (France)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (France)

Author keywords

Ellipsometry; In situ metrology; Real time; Resist trimming; Scatterometry

Indexed keywords

AFM; APPLIED MATERIALS; ETCH PROCESS; HARDWARE TOOLS; IN SITU METROLOGY; IN-SITU; MICRO-ELECTRONIC DEVICES; OPTICAL METROLOGY TECHNIQUES; REAL TIME; REAL-TIME PROCESS CONTROLS; RESIST TRIMMING; SCATTEROMETRY; WAVELENGTH RANGES;

ELECTRON BEAM LITHOGRAPHY; ELLIPSOMETRY; TRIMMING;

PROCESS CONTROL;

EID: 65549165067     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.12.036     Document Type: Article

References (10)

1. Niu X., Jakatdar N., Bao J., and Spanos C.J. IEEE Trans. Semicond. Manuf. 14 2 (2001)
2. S. Soulan, M. Besacier, P. Schiavone, in: Proceedings of the SPIE Conference on Modelling Aspects in Optical Metrology, vol. 6617, 2007.
3. Cunge G., Inglebert R.L., Joubert O., Vallier L., and Sadeghi N. J. Vac. Sci. Technol. B 20 (2002) 2137
4. Maynard H.L., Layadi N., and Tseng-Chung Lee J. J. Vac. Sci. Technol. B 15 1 (1997)
5. M Azzam R., and M Bashara N. Ellipsometry and Polarized Light (1977), North-Holland
6. Li L. J. Opt. Soc. Am. A 14 10 (1997) 10
7. Raymond C.J., et al. Proc. SPIE 5375 (2004) 564-575
8. Tikhonov A., and Arsenin V. Solution of Ill-posed Problems (1977), Wiley, New York
9. Busstos B., et al. A graphics hardware accelerated algorithm for nearest neighbor search. Lecture Notes in Computer Science vol. 3994/2006 (2006), Springer
10. Foucher J., Fabre A.L., and Gautier P. Proc. SPIE 6152 (2006)