Feasibility study on immersion system using high-index materials

Japanese Journal of Applied Physics

Volumn 47, Issue 6 PART 2, 2008, Pages 4853-4861

  Sakai, Keita ^a   Iwasaki, Yuichi ^a   Mori, Sunao ^a   Yamada, Akihiro ^a   Ogusu, Makoto ^a   Yamashita, Keiji ^a   Nishikawara, Tomofumi ^a   Kara, Shin Ichi ^a   Watanabe, Yutaka ^a  

^a CANON INC   (Japan)

Author keywords

ArF lithography; High index immersion fluid; High index lens material; Immersion lithography; LuAG; Second generation fluid

Indexed keywords

DECISION MAKING; DISSOLUTION; DISSOLVED OXYGEN; FLUIDS; LENSES; OPTICAL INSTRUMENTS; OXYGEN; PHOTOLITHOGRAPHY; PLANNING; RESOURCE ALLOCATION;

ARF LITHOGRAPHY; HIGH-INDEX IMMERSION FLUID; HIGH-INDEX LENS MATERIAL; IMMERSION LITHOGRAPHY; LUAG; SECOND-GENERATION FLUID;

OPTICAL WAVEGUIDES;

EID: 55049087245     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.4853     Document Type: Article

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