Impact of electron-beam lithography irregularities across millimeter-scale resonant grating filter performances

Applied Optics

Volumn 49, Issue 4, 2010, Pages 658-662

  Talneau, Anne ^a   Lemarchand, Fabien ^b   Fehrembach, Anne Laure ^b   Sentenac, Anne ^b  

^a CNRS   (France)

^b AIX MARSEILLE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BANDPASS FILTERS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRONS; PERIODIC STRUCTURES; PHOTONIC DEVICES;

ACCEPTABLE LIMIT; ELECTRON BEAM WRITING; GUIDING STRUCTURES; HIGH INDEX CONTRAST; MILLIMETER-SCALE; RESONANT GRATING FILTER; RESONANT GRATINGS; STITCHING ERRORS;

NOTCH FILTERS;

EID: 76649144528     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.49.000658     Document Type: Article

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