-
1
-
-
0038529280
-
Physical and predictive models of ultrathin oxide reliability in CMOS devices and circuits
-
March
-
J. H. Stathis. Physical and predictive models of ultrathin oxide reliability in CMOS devices and circuits. IEEE Trans. Device and Mater. Rel., 1(1):43-59, March 2001.
-
(2001)
IEEE Trans. Device and Mater. Rel.
, vol.1
, Issue.1
, pp. 43-59
-
-
Stathis, J.H.1
-
2
-
-
0036508417
-
CMOS scaling beyond the 100-nm node with silicon-dioxide-based gate dielectrics
-
March/May
-
E. Y. Wu et al. CMOS scaling beyond the 100-nm node with silicon-dioxide-based gate dielectrics. IBM J. Res. Dev., 46(2/3):287-298, March/May 2002.
-
(2002)
IBM J. Res. Dev.
, vol.46
, Issue.2-3
, pp. 287-298
-
-
Wu, E.Y.1
-
3
-
-
0345225496
-
A comparative study of the oxide breakdown in short-channel nMOSFETs and pMOSFETs stressed in inversion and in accumulation regimes
-
March
-
F. Crupi et al. A comparative study of the oxide breakdown in short-channel nMOSFETs and pMOSFETs stressed in inversion and in accumulation regimes. IEEE Trans. Device and Mater. Rel., 3(1):8-13,March 2003.
-
(2003)
IEEE Trans. Device and Mater. Rel.
, vol.3
, Issue.1
, pp. 8-13
-
-
Crupi, F.1
-
4
-
-
37549011322
-
Impact of random soft oxide breakdown on SRAM energy/delay drift
-
December
-
H. Wang et al. Impact of random soft oxide breakdown on SRAM energy/delay drift. IEEE Trans. Device and Mater. Rel., 7(4):581-591, December 2007.
-
(2007)
IEEE Trans. Device and Mater. Rel.
, vol.7
, Issue.4
, pp. 581-591
-
-
Wang, H.1
-
5
-
-
33747905416
-
Relation between breakdown mode and location in short-channel nMOSFETs and its impact on reliability specifications
-
September
-
R. Degraeve et al. Relation between breakdown mode and location in short-channel nMOSFETs and its impact on reliability specifications. IEEE Trans. Device and Mater. Rel., 1(3):163-169, September 2001.
-
(2001)
IEEE Trans. Device and Mater. Rel.
, vol.1
, Issue.3
, pp. 163-169
-
-
Degraeve, R.1
-
6
-
-
34250742624
-
Prediction of logic product failure due to thin-gate oxide breakdown
-
March
-
Y. H. Lee et al. Prediction of logic product failure due to thin-gate oxide breakdown. In Proc. IRPS, pages 18-28, March 2006.
-
(2006)
Proc. IRPS
, pp. 18-28
-
-
Lee, Y.H.1
-
7
-
-
57849125876
-
A statistical approach for full-chip gate-oxide reliability analysis
-
November
-
K. Chopra et al. A statistical approach for full-chip gate-oxide reliability analysis. In Proc. ICCAD, pages 698-705, November 2008.
-
(2008)
Proc. ICCAD
, pp. 698-705
-
-
Chopra, K.1
-
8
-
-
41949086011
-
Gate oxide wear-out and breakdown effects on the performance of analog and digital circuits
-
April
-
R. Fernández et al. Gate oxide wear-out and breakdown effects on the performance of analog and digital circuits. IEEE Trans. Electron Devices, 55(4):997-1004, April 2008.
-
(2008)
IEEE Trans. Electron Devices
, vol.55
, Issue.4
, pp. 997-1004
-
-
Fernández, R.1
-
9
-
-
0036494245
-
Impact of MOSFET gate oxide breakdown on digital circuit operation and reliability
-
March
-
B. Kaczer et al. Impact of MOSFET gate oxide breakdown on digital circuit operation and reliability. IEEE Trans. Electron Devices, 49(3):500-506, March 2002.
-
(2002)
IEEE Trans. Electron Devices
, vol.49
, Issue.3
, pp. 500-506
-
-
Kaczer, B.1
-
10
-
-
0036494130
-
Consistent model for short-channel nMOSFET after hard gate oxide breakdown
-
March
-
B. Kaczer et al. Consistent model for short-channel nMOSFET after hard gate oxide breakdown. IEEE Trans. Electron Devices, 49(3):507-513, March 2002.
-
(2002)
IEEE Trans. Electron Devices
, vol.49
, Issue.3
, pp. 507-513
-
-
Kaczer, B.1
-
12
-
-
0027701389
-
An exact solution to the transistor sizing problem for CMOS circuits using convex optimization
-
November
-
S. S. Sapatnekar et al. An exact solution to the transistor sizing problem for CMOS circuits using convex optimization. IEEE Trans. Comput.-Aided Des., 12(11):1621-1634, November 1993.
-
(1993)
IEEE Trans. Comput.-Aided Des.
, vol.12
, Issue.11
, pp. 1621-1634
-
-
Sapatnekar, S.S.1
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