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Volumn , Issue , 2010, Pages 638-645

Scalable methods for the analysis and optimization of gate oxide breakdown

Author keywords

[No Author keywords available]

Indexed keywords

CIRCUIT FAILURES; CLOSED-FORM MODELS; FAILURE PROBABILITY; GATE OXIDE BREAKDOWN; GATE SIZING; OPTIMIZATION APPROACH; OXIDE RELIABILITY; POSYNOMIAL; SCALABLE METHODS; SCALING METHOD;

EID: 77952596529     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISQED.2010.5450507     Document Type: Conference Paper
Times cited : (19)

References (13)
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    • Stathis, J.H.1
  • 2
    • 0036508417 scopus 로고    scopus 로고
    • CMOS scaling beyond the 100-nm node with silicon-dioxide-based gate dielectrics
    • March/May
    • E. Y. Wu et al. CMOS scaling beyond the 100-nm node with silicon-dioxide-based gate dielectrics. IBM J. Res. Dev., 46(2/3):287-298, March/May 2002.
    • (2002) IBM J. Res. Dev. , vol.46 , Issue.2-3 , pp. 287-298
    • Wu, E.Y.1
  • 3
    • 0345225496 scopus 로고    scopus 로고
    • A comparative study of the oxide breakdown in short-channel nMOSFETs and pMOSFETs stressed in inversion and in accumulation regimes
    • March
    • F. Crupi et al. A comparative study of the oxide breakdown in short-channel nMOSFETs and pMOSFETs stressed in inversion and in accumulation regimes. IEEE Trans. Device and Mater. Rel., 3(1):8-13,March 2003.
    • (2003) IEEE Trans. Device and Mater. Rel. , vol.3 , Issue.1 , pp. 8-13
    • Crupi, F.1
  • 4
    • 37549011322 scopus 로고    scopus 로고
    • Impact of random soft oxide breakdown on SRAM energy/delay drift
    • December
    • H. Wang et al. Impact of random soft oxide breakdown on SRAM energy/delay drift. IEEE Trans. Device and Mater. Rel., 7(4):581-591, December 2007.
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    • Wang, H.1
  • 5
    • 33747905416 scopus 로고    scopus 로고
    • Relation between breakdown mode and location in short-channel nMOSFETs and its impact on reliability specifications
    • September
    • R. Degraeve et al. Relation between breakdown mode and location in short-channel nMOSFETs and its impact on reliability specifications. IEEE Trans. Device and Mater. Rel., 1(3):163-169, September 2001.
    • (2001) IEEE Trans. Device and Mater. Rel. , vol.1 , Issue.3 , pp. 163-169
    • Degraeve, R.1
  • 6
    • 34250742624 scopus 로고    scopus 로고
    • Prediction of logic product failure due to thin-gate oxide breakdown
    • March
    • Y. H. Lee et al. Prediction of logic product failure due to thin-gate oxide breakdown. In Proc. IRPS, pages 18-28, March 2006.
    • (2006) Proc. IRPS , pp. 18-28
    • Lee, Y.H.1
  • 7
    • 57849125876 scopus 로고    scopus 로고
    • A statistical approach for full-chip gate-oxide reliability analysis
    • November
    • K. Chopra et al. A statistical approach for full-chip gate-oxide reliability analysis. In Proc. ICCAD, pages 698-705, November 2008.
    • (2008) Proc. ICCAD , pp. 698-705
    • Chopra, K.1
  • 8
    • 41949086011 scopus 로고    scopus 로고
    • Gate oxide wear-out and breakdown effects on the performance of analog and digital circuits
    • April
    • R. Fernández et al. Gate oxide wear-out and breakdown effects on the performance of analog and digital circuits. IEEE Trans. Electron Devices, 55(4):997-1004, April 2008.
    • (2008) IEEE Trans. Electron Devices , vol.55 , Issue.4 , pp. 997-1004
    • Fernández, R.1
  • 9
    • 0036494245 scopus 로고    scopus 로고
    • Impact of MOSFET gate oxide breakdown on digital circuit operation and reliability
    • March
    • B. Kaczer et al. Impact of MOSFET gate oxide breakdown on digital circuit operation and reliability. IEEE Trans. Electron Devices, 49(3):500-506, March 2002.
    • (2002) IEEE Trans. Electron Devices , vol.49 , Issue.3 , pp. 500-506
    • Kaczer, B.1
  • 10
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    • Consistent model for short-channel nMOSFET after hard gate oxide breakdown
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    • B. Kaczer et al. Consistent model for short-channel nMOSFET after hard gate oxide breakdown. IEEE Trans. Electron Devices, 49(3):507-513, March 2002.
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  • 12
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    • An exact solution to the transistor sizing problem for CMOS circuits using convex optimization
    • November
    • S. S. Sapatnekar et al. An exact solution to the transistor sizing problem for CMOS circuits using convex optimization. IEEE Trans. Comput.-Aided Des., 12(11):1621-1634, November 1993.
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    • Sapatnekar, S.S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.