Deposition of microcrystalline Si1-xGex by RF magnetron sputtering on SiO2 substrates

Japanese Journal of Applied Physics

Volumn 48, Issue 4 PART 2, 2009, Pages

  Hiroe, Akihiko ^a   Goto, Tetsuya ^a   Teramoto, Akinobu ^a   Ohmi, Tadahiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE PHASE; CRYSTALLINITIES; CRYSTALLINITY CHANGES; DEPOSITION BEHAVIOR; ELECTRON BACK SCATTER DIFFRACTION; HEAT-UP; MELTING TEMPERATURES; MICROCRYSTALLINE SI; RF BIAS; RF-MAGNETRON SPUTTERING; SUBSTRATE BIAS EFFECTS; TEM;

CRYSTALLINE MATERIALS; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SPECTROSCOPIC ELLIPSOMETRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

SUBSTRATES;

EID: 77952488112     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.04C124     Document Type: Article

References (17)

1. K. Shiota, D. Inoue, K. Minami, M. Yamamoto, and J. Hanna: Jpn. J. Appl. Phys. 36 (1997) L989.
2. G. Yu, K. M. Krishna, C. Shao, M. Umeno, T. Sogac, J. Watanabe, and T. Jimbod: J. Appl. Phys. 83 (1998) 174.
3. M. Meaudre, M. E. Gueunier-Farret, R. Meaudre, J. P. Kleider, S. Vignoli, and B. Canut: J. Appl. Phys. 98 (2005) 033531.
4. A. R. Zanatta and I. Chambouleyron: J. Appl. Phys. 97 (2005) 094914.
5. T. Sadoh, H. Kamizuru, A. Kenjo, and M. Miyao: Jpn. J. Appl. Phys. 46 (2007) 1250.
6. I. Tsunoda, A. Kenjo, T. Sadoh, and M. Miyao: Appl. Surf. Sci. 224 (2004) 231.
7. T. Goto, T. Matsuoka, and T. Ohmi: submitted to J. Vac. Sci. Technol.
8. J. A. Thornton: J. Vac. Sci. Technol. 11 (1974) 666.
9. H. Kobayashi: Supatta Hakumaku (Sputtered Thin Films) (Nikkan Kogyo Shimbun, Tokyo, 1993) p. 80 [in Japanese].
10. E. A. Stern, C. E. Bouldin, B. von Roedern, and J. Azoulay: Phys. Rev. B 27 (1983) 6557.
11. E. V. Jelenkovic, K. Y. Tong, Z. Sun, C. L. Mak, and W. Y. Cheung: J. Vac. Sci. Technol. A 15 (1997) 2836.
12. P. R. Poulsen, M. Wang, J. Xu, W. Li, K. Chen, G. Wang, and D. Feng: J. Appl. Phys. 84 (1998) 3386.
13. C. Pickering and R. T. Carline: J. Appl. Phys. 75 (1994) 4642.
14. M. Cardona and F. H. Pollak: Phys. Rev. 142 (1966) 530.
15. M. I. Alonso and K. Winer: Phys. Rev. B 39 (1989) 10056.
16. E. Krikorian and R. J. Snead: J. Appl. Phys. 37 (1966) 3665.
17. I. H. Kahn: J. Appl. Phys. 44 (1973) 14.