Atmospheric oxygen plasma activation of silicon (100) surfaces

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 3, 2010, Pages 476-485

  Habib, Sara B ^a   Gonzalez, Eleazar ^a   Hicks, Robert F ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC OXYGEN; COVALENTLY BONDED; DISPERSIVE COMPONENTS; HYDROPHILIC STATE; OXYGEN ATOM; OXYGEN PLASMAS; PLASMA BEAM; PLASMA OXIDATION; POLAR COMPONENTS; RADIO FREQUENCIES; SI(100) SURFACE; SILICON (100); SILICON SURFACES; SURFACE ENERGIES; SURFACE OXIDATIONS; TREATMENT TIME; WATER CONTACT ANGLE;

ATMOSPHERIC PRESSURE; CONTACT ANGLE; HELIUM; INTERFACIAL ENERGY; MONOLAYERS; OXIDATION; OXYGEN; PLASMAS; SURFACE CHEMISTRY; SURFACE TENSION; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICALS REMOVAL (WATER TREATMENT);

EID: 77952385243     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3374738     Document Type: Article

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