Oxide growth on silicon (100) in the plasma phase of dry oxygen using an electron cyclotron resonance source

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 4, 1996, Pages 2667-2673

  Kim, Keunjoo ^a   An, M H ^a   Shin, Y G ^a   Suh, M S ^a   Youn, G J ^a   Lee, Y H ^a   Lee, K B ^a   Lee, H J ^a  

^a Chonbuk National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042978287     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589002     Document Type: Article

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