Characterization of an atmospheric pressure radio-frequency capacitive plasma jet

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Laimer, Johann ^a   Haslinger, Stefan ^a   Störi, Herbert ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Atmospheric pressure glow discharge (APGD); Atmospheric pressure plasma jet (APPJ); Density; Non thermal plasma; Radio frequency glow discharge (RFGD); Strength

Indexed keywords

ATMOSPHERIC PRESSURE GLOW DISCHARGE (APGD); ATMOSPHERIC PRESSURE PLASMA JET (APPJ); DENSITY; NON-THERMAL PLASMA; RADIO FREQUENCY GLOW DISCHARGE (RFGD); STRENGTH;

ARGON; ATMOSPHERICS; ELECTRODES; GAS MIXTURES; GLOW DISCHARGES; HELIUM; PLASMA ACCELERATORS; PLASMA JETS; PLASMA SOURCES; RADIO; RADIO WAVES;

ATMOSPHERIC PRESSURE;

EID: 69249243106     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200731212     Document Type: Conference Paper

References (22)

1. E. E. Kunhardt, IEEE Trans. Plasma Sci. 2000, 28, 189.
2. US patent 5.961.772, (1999), inv.: G. S. Selwyn.
3. J. Park, I. Henins, H. W. Herrmann, G. S. Selwyn, J. Appl. Phys. 2001, 89, 20.
4. X. Yang, M. Moravej, G. R. Nowling, S. E. Babayan, J. Panelon, J. P. Chang, R. F. Hicks, Plasma Sources Sci. Technol. 2005, 14, 314.
5. J. Laimer, S. Haslinger, W. Meissl, J. Hell, H. Störi, Vacuum 2005, 79, 209.
6. J. Park, I. Henins, H. W. Herrmann, G. S. Selwyn, J. Appl. Phys. 2001, 89, 15.
7. S. Wang, V. Schultz von der Gathen, H. F. Döbele, Appl. Phys. Lett. 2003, 83, 3272.
8. K. Niemi, V. Schulz von der Gathen, H. F. Döbele, Plasma Source Sci. Technol. 2005, 14, 375.
9. M. Moravej, X. Yang, G. R. Nowling, J. P. Chang, R. F. Hicks, J. Appl. Phys. 2004, 96, 7011.
10. X. Yang, M. Moravej, S. E. Babayan, G. R. Nowling, R. F. Hicks, Plasma Sources Sci. Technol. 2005, 14, 412.
11. M. Moravej, X. Yang, M. Barankin, J. Penelon, S. E. Babayan, R. F. Hicks, Plasma Sources Sci. Technol. 2006, 15, 204.
12. S. Y. Moon, J. Han, W. Choe, Phys. Plasmas 2006, 13, 013504.
13. J. Laimer, H. Störi, Plasma Process. Polym. 2006, 3, 573.
14. S. Y. Moon, J. K. Rhee, D. B. Kim, W. Choe, Phys. Plasmas 2006, 13, 033502.
15. M. A. Lieberman, A. J. Lichtenberg, "Principles of Plasma Discharges and Materials Processing", Wiley, New York 1994.
16. J. J. Shi, X. T. Deng, R. Hall, J. D. Punnett, M. G. Kong, J. Appl. Phys. 2003, 94, 6303.
17. M. A. Lieberman, IEEE Trans. Plasma Sci. 1989, 17, 338.
18. Y. P. Raizer, "Gas Discharge Physics", Springer-Verlag, Berlin, Heidelberg 1991.
19. M. Konuma, "Film Deposition by Plasma Techniques", Springer-Verlag, Berlin, Heidelberg 1992.
20. Y. P. Raizer, M. N. Shneider, N. A. Yatsenko, "Radio-Frequency Capacitive Discharge", CRC, Boca Raton 1995.
21. J. J. Shi, M. G. Kong, Phys. Rev. Lett. 2006, 96, 105009.
22. J. Park, I. Henins, H. W. Herrmann, G. S. Selwyn, Phys. Plasmas 2000, 7, 3141.