On the origin of the hydrophobic water gap: An X-ray reflectivity and MD simulation study

Journal of the American Chemical Society

Volumn 132, Issue 19, 2010, Pages 6735-6741

  Mezger, Markus ^a,b   Sedlmeier, Felix ^c   Horinek, Dominik ^c   Reichert, Harald ^a,d   Pontoni, Diego ^d   Dosch, Helmut ^a,e  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b University of California   (United States)

^c TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^d EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^e DESY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL RESULTS; HIGH ENERGY X RAY; HYDROPHOBIC COATINGS; HYDROPHOBIC INTERFACE; HYDROPHOBIC WATER; MD SIMULATION; MOLECULAR DYNAMICS SIMULATIONS; MOLECULAR GEOMETRIES; MOLECULAR SCALE; SPATIAL RESOLUTION; THEORETICAL STUDY; UNDERLYING MECHANISM; X RAY REFLECTIVITY;

COMPUTER SIMULATION; CONTACT ANGLE; MOLECULAR DYNAMICS; MONOLAYERS; REFLECTION; SURFACE CHEMISTRY; SURFACE TOPOGRAPHY; X RAY DIFFRACTION;

HYDROPHOBICITY;

SELF ASSEMBLED MONOLAYER; SILANE DERIVATIVE; SILICON; WATER;

ARTICLE; COMPUTER MODEL; ELECTRON; GEOMETRY; HYDROPHOBICITY; MATERIAL COATING; MOLECULAR DYNAMICS; QUANTUM CHEMISTRY; X RAY;

EID: 77952370938     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/ja910624j     Document Type: Article

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