Approaching routine 2π/1000 phase resolution for off-axis type holography

Ultramicroscopy

Volumn 110, Issue 5, 2010, Pages 447-459

  Voelkl, Edgar ^a   Tang, Dong ^a  

^a Thermo Fisher Scientific   (United States)

Author keywords

Amplitude noise; Off axis holography; Phase noise; Phase resolution; Sampling rate

Indexed keywords

AMPLITUDE NOISE; DIFFUSE SCATTERING; IN-VACUUM; LIGHT OPTICS; OFF-AXIS ELECTRON HOLOGRAPHY; OFF-AXIS HOLOGRAPHY; OFF-AXIS TYPES; OPTICAL ELEMENTS; OPTICAL PHASE; PHASE RESOLUTION;

ELECTRON BEAMS; ELECTRON HOLOGRAPHY; ELECTRONS; LIGHT; LIGHT REFLECTION; OPTICS; PHASE NOISE; RADIATION DAMAGE;

LASER RECORDING;

ARTICLE; ARTIFACT REDUCTION; BRIGHTNESS; CONTROLLED STUDY; DISPERSION; ELECTRON BEAM; HOLOGRAPHY; IMAGE PROCESSING; LASER; OFF AXIS HOLOGRAPHY; OPTICS; RADIATION INJURY; RADIOSENSITIVITY; SENSITIVITY AND SPECIFICITY; SIGNAL NOISE RATIO; VACUUM;

EID: 77952320263     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2009.11.017     Document Type: Article

References (30)

1. Möllenstedt G., Düker H. Zeitschrift fur Physik 1956, 145:377-397.
2. Leith E.N., Upatnieks J. Journal of the Optical Society of America 1962, 52(10).
3. H. Lichte et al., EUREM 12, Brno, Czech Republic, July 9-14, 2000.
4. Lehmann M., Voelkl E., Lenz F. Ultramicroscopy 1994, 54:335-344.
5. Rau W.-D., Lichte H., Voelkl E., Weierstall U. Journal of Computer-Assisted Microscopy 1991, 3:51-63.
6. E. Voelkl, Ultramicroscopy (2009), doi:10.1016/j.ultramic.2009.11.010.
7. Reimer L. Transmission Electron Microscopy 1989, Springer, Berlin.
8. Daberkow I., Herrmann K.-H., Liu L., Rau W.D. Ultramicroscopy 1991, 38:215-223.
9. deRuijter W.J., Weiss J.K. Review of Scientific Instruments 1992, 63:4314-4321.
10. Zuo J.M. Microscopy Research and Technique 2000, 49:245-268.
11. Meyer R.R., et al. Ultramicroscopy 2000, 85(1):9-13.
12. Cooper D., et al. Applied Physics Letters 2007, 91(14):id143501.
13. Voelkl E., Allard L.F., Frost B.G. Scanning Microscopy 1997, 11:407-416.
14. M. Haider, et al., Prerequisites for a Cc/Cs-corrected ultrahigh-resolution TEM. Ultramicroscopy 108 (3) (2008) 167-178.
15. DigitalMicrograph®, Gatan Inc., Pleasanton, California. http://www.gatan.com.
16. Software HoloWorks (version 5), Gatan Inc., Pleasanton, California Web address: 〈 or 〉. http://www.holowerk.com.
17. K. Harada, et al., Appl. Phys. Lett. 84 (2004) 3229-3231.
18. US Patent 7,538,323. http://www.faqs.org/patents/app/20080258058.
19. http://en.wikipedia.org/w/index.php?titleStandarddeviationoldid309109130.
20. Walkup J.F., Goodman J.W. J. Opt. Soc. Am. 1973, 63:399.
21. Lichte H., et al. Optik 1987, 77(3).
22. Lichte H. Ultramicroscopy 2008, 108:256-262.
23. Harscher A., Lichte H. Ultramicroscopy 1996, 64:57-66.
24. deRuijter W.J., Weiss J.K. Ultramicroscopy 1993, 50.
25. W.J. deRuijter, P.E. Mooney, E. Voelkl, MSA Bulletin 24 (1994) 451-458.
26. Lehmann M., Lichte H. Microscopy and Microanalysis 2002, 8:447-466.
27. D.J. Smith, et al., in: E. Voelkl, L.F. Allard, D.C. Joy (Eds.), Introduction to Electron Holography, Kluwer Academic/Plenum Publishers, 1999.
28. L.F. Allard, E. Voelkl, in: E. Voelkl, L.F. Allard, D.C. Joy (Eds.), Introduction to Electron Holography, Kluwer Academic/Plenum Publishers, 1999.
29. Fu Q., Lichte H., Voelkl E. Physical Review Letters 1991, 67(17).
30. Freitag B., et al. Microscopy and Microanalysis 2009, 15(Suppl. 2):1098-1099.