Influence of laser microfabrication on silicon electrochemical behavior in HF solution

Journal of Solid State Electrochemistry

Volumn 14, Issue 5, 2010, Pages 797-802

  Juodkazis, Kestutis ^a   Juodkazytė, Jurga ^a   Kalinauskas, Putinas ^a   Gertus, Titas ^b,c   Jelmakas, Edgaras ^d   Misawa, Hiroaki ^e   Juodkazis, Saulius ^e  

^a CENTER FOR PHYSICAL SCIENCES AND TECHNOLOGY   (Lithuania)

^b Altechna   (Lithuania)

^c VILNIUS UNIVERSITY   (Lithuania)

^d Institute of Materials Science and Applied Research   (Lithuania)

^e HOKKAIDO UNIVERSITY   (Japan)

Author keywords

HF solution; Laser microfabrication; Si electrochemical processes

Indexed keywords

ANODIC OXIDATION; ELECTROMAGNETIC PULSE; HYDROFLUORIC ACID; LASER ABLATION; MICROANALYSIS; MICROFABRICATION; SILICA; SILICON; SILICON OXIDES; SOLUTIONS;

DIRECT LASER WRITING; ELECTROCHEMICAL BEHAVIORS; ELECTROCHEMICAL PROCESS; HF SOLUTIONS; LASER MICRO-FABRICATION; MORPHOLOGY AND STRUCTURES; PROTECTIVE LAYERS; SILICON SURFACES;

ELECTROCHEMICAL ETCHING;

EID: 77952289269     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10008-009-0852-z     Document Type: Article

References (34)

1. Kovacs GT, Maluf NI, Petersen KE (1998) Proc IEEE 86:1536.
2. Klür MH, Sauermann A, Elsner CA, Thein KH, Dertinger SK (2006) Adv Mat 18:3135.
3. Lehmann V (1996) Appl Surf Sci 106:402.
4. Jakubowicz J (2007) Superlattices Microstruct 41:205
5. Lehman V, Föll H (1990) J Electrochem Soc 137:653.
6. Lehman V (1993) J Electrochem Soc 140:2836.
7. Lehman V, Grüming U (1997) Thin Solid Films 297:13.
8. Ubara H, Imura T, Hiraki A (1984) Solid State Comm 50:673
9. Burrows VA, Chabal YJ, Higashi GS, Raghavachari K, Christman SB (1988) Appl Phys Lett 53:998.
10. Gerisher H, Allongue P, Kieling VC (1993) Ber Bunsenges Phys Chem 97:753.
11. Smith RL, Collins SD (1992) J Appl Phys 71:R1.
12. Kolasinski KW (2003) Phys Chem Chem Phys 5:1270.
13. Turova NY (1977) Spravochnye tablitsy po neorganicheskoi khimii. Khimiya, Leningrad.
14. Outemzabet R, Cherkaoui M, Gabouze N, Ozanam F, Kesri N, Chazalviel JN (2006) J Electrochem Soc 153:C108.
15. Houbertz R, Memmert U, Behm RJ (1998) Surf Sci 369:198.
16. Foll H, Christophersen M, Carstensen J, Hasse G (2002) Mat Sci Eng Rep 39:93.
17. Carstensen J, Christophersen M, Foll H (2000) Mat Sci Eng B 69:23.
18. Juodkazis S, Matsuo S, Misawa H, Mizeikis V, Marcinkevicius A, Sun HB, Tokuda Y, Takahashi M, Yoko T, Nishii J (2002) J Appl Surf Sci 197-198:705.
19. Gamaly EE, Juodkazis S, Nishimura K, Misawa H, Luther-Davies B, Hallo L, Nicolai P, Tikhonchuk V (2006) Phys Rev B 73:214101.
20. Juodkazis S, Nishimura K, Tanaka S, Misawa H, Gamaly EE, Luther-Davies B, Hallo L, Nicolai P, Tikhonchuk V (2006) Phys Rev Lett 96:166101.
21. Sundaram SK, Mazur E (2002) Nat Mater 1:217.
22. Watanabe M, Juodkazis S, Sun HB, Matsuo S, Misawa H (1999) Phys Rev B 60:9959.
23. Juodkazis S, Watanabe M, Sun HB, Matsuo S, Nishii J, Misawa H (2000) Appl Surf Sci 154:696.
24. Eliseev P, Sun HB, Juodkazis S, Sugahara T, Sakai S, Misawa H (1999) Jpn J Appl Phys 38:L839.
25. Böer KW (1990) Survey of semiconductor physics: electrons and other particles in bulk semiconductors, vol I. Van Nostrand Reinhold, NY, New York.
26. Zel'dovich YB, Raizer YP (2002) Physics of shock waves and high-temperature hydrodynamic phenomena. Dover, Mineola, New York.
27. Dremin AN (2000) Combust Explos Shock Waves 36:704
28. Johnson Q, Mitchell AC (1972) Phys Rev Lett 29:1369.
29. Devine RAB, Dupree R, Farnan I, Capponi JJ (1987) Phys Rev B 35:2560.
30. Belonoshko AB (1997) Science 275:955.
31. McMillan PF (2005) Nat Mater 4:715.
32. Juodkazis S, Nishimura K, Misawa H, Ebisui T, Waki R, Matsuo S, Okada T (2006) Adv Mater 18:1361
33. Juodkazis S, Misawa H (2008) Appl Phys A 93:857
34. Juodkazis S, Mizeikis V, Sudžius M, Misawa H, Kitamura K, Takekawa S, Gamaly EG, Krolikowski WZ, Rode AV (2008) Appl Phys A 93:129