Recent Development and Applications of Polymers Having Lactone-Unit

Kobunshi

Volumn 57, Issue 10, 2008, Pages 850-855

  Hasegawa, Etsuo ^a   Maeda, Katsumi ^a  

^a NEC CORPORATION   (Japan)

Author keywords

ArF Excimer Laser; Lactone; Lithography; Polymers Containing Lactone Unit; Resist

Indexed keywords

EID: 77952239259     PISSN: 04541138     EISSN: None     Source Type: Journal    
DOI: 10.1295/kobunshi.57.850     Document Type: Article

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