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Volumn 40, Issue 12, 2001, Pages 7162-7165
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ArF chemically amplified positive resist based on alicyclic lactone polymer
a
a
NEC CORPORATION
(Japan)
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Author keywords
Acrylate polymer; Alicyclic lactone; ArF excimer laser; Dry etching resistance; Positive resist
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Indexed keywords
ACRYLICS;
ARGON;
DRY ETCHING;
EXCIMER LASERS;
FREE RADICAL POLYMERIZATION;
HYDROPHILICITY;
HYDROPHOBICITY;
MONOMERS;
NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY;
STRUCTURE (COMPOSITION);
THERMODYNAMIC STABILITY;
ULTRAVIOLET SPECTROSCOPY;
ALICYCLIC ACRYLATES;
HYDROPHILIC GROUP;
NORBORNYL ACRYLATE;
NORBORNYL GROUP;
PHOTOACID GENERATOR;
POSITIVE RESIST;
PHOTORESISTS;
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EID: 0035713517
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.40.7162 Document Type: Article |
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Times cited : (12)
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References (10)
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