Light- and ion-gauge-induced space charges in tris-(8-hydroxyquinolate) aluminum-based organic light-emitting diodes

Applied Physics Letters

Volumn 96, Issue 14, 2010, Pages

  Noguchi, Yutaka ^a,b   Sato, Naoki ^a   Miyazaki, Yukimasa ^a   Ishii, Hisao ^a  

^a CHIBA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE-VOLTAGE CURVE; DEVICE FABRICATIONS; INDUCED SPACES; LIGHT IRRADIATIONS; NEGATIVE SPACE CHARGE; POSITIVELY CHARGED; SPACE CHARGE FORMATIONS; SPATIAL IN-HOMOGENEITY;

ALUMINUM; ELECTRIC SPACE CHARGE; GAGES; LIGHT EMISSION; LIGHT EMITTING DIODES;

ORGANIC LIGHT EMITTING DIODES (OLED);

EID: 77951201630     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3374405     Document Type: Article

References (24)

1. G. G. Malliaras and J. C. Scott, J. Appl. Phys. JAPIAU 0021-8979 83, 5399 (1998). 10.1063/1.367369
2. B. Ruhstaller, S. A. Carter, S. Barth, H. Riel, W. Riess, and J. C. Scott, J. Appl. Phys. JAPIAU 0021-8979 89, 4575 (2001). 10.1063/1.1352027
3. W. Brütting, S. Berleb, and A. G. Mückl, Org. Electron. OERLAU 1566-1199 2, 1 (2001). 10.1016/S1566-1199(01)00009-X
4. H. Wang, K. P. Klubek, and C. W. Tang, Appl. Phys. Lett. APPLAB 0003-6951 93, 093306 (2008). 10.1063/1.2978349
5. H. Aziz, Z. D. Popovic, N. -X. Hu, A. -M. Hor, and G. Xu, Science SCIEAS 0036-8075 283, 1900 (1999). 10.1126/science.283.5409.1900 (Pubitemid 29144204)
6. R. H. Young, C. W. Tang, and A. P. Marchetti, Appl. Phys. Lett. APPLAB 0003-6951 80, 874 (2002). 10.1063/1.1445271 (Pubitemid 34148213)
7. T. Haskins, A. Chowdhury, R. H. Young, J. R. Lenhard, A. P. Marchetti, and L. J. Rothberg, Chem. Mater. CMATEX 0897-4756 16, 4675 (2004). 10.1021/cm049538k
8. M. Matsumura, Y. Jinde, T. Akai, and T. Kimura, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 35, 5735 (1996). 10.1143/JJAP.35.5735
9. W. Brütting, H. Riel, T. Beierlein, and W. Rieß, J. Appl. Phys. JAPIAU 0021-8979 89, 1704 (2001). 10.1063/1.1332088 (Pubitemid 33629990)
10. D. Y. Kondakov, J. R. Sandifer, C. W. Tang, and R. H. Young, J. Appl. Phys. JAPIAU 0021-8979 93, 1108 (2003). 10.1063/1.1531231
11. V. V. Jarikov and D. Y. Kondakov, J. Appl. Phys. JAPIAU 0021-8979 105, 034905 (2009). 10.1063/1.3072622
12. Y. Noguchi, N. Sato, Y. Tanaka, Y. Nakayama, and H. Ishii, Appl. Phys. Lett. APPLAB 0003-6951 92, 203306 (2008). 10.1063/1.2936084 (Pubitemid 351733941)
13. E. Ito, N. Hayashi, H. Ishii, N. Matsuie, K. Tsuboi, Y. Ouchi, Y. Harima, K. Yamashita, and K. Seki, J. Appl. Phys. JAPIAU 0021-8979 92, 7306 (2002). 10.1063/1.1518759
14. We employed a nude ion-gauge (Canon Anelva Tech., NIG-2F) and a controller (YSL, VX-200B) to evaluate the process pressure.
15. A. J. Twarowski and A. C. Albrecht, J. Chem. Phys. JCPSA6 0021-9606 70, 2255 (1979). 10.1063/1.437729
16. S. Egusa, A. Miura, N. Gemma, and M. Azuma, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 33, 2741 (1994). 10.1143/JJAP.33.2741
17. S. Ogawa, Y. Kimura, H. Ishii, and M. Niwano, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 42, L1275 (2003). 10.1143/JJAP.42.L1275
18. N. Sato, Y. Noguchi, Y. Tanaka, Y. Nakayama, and H. Ishii, Proc. SPIE PSISDG 0277-786X 7051, 70511S (2008). 10.1117/12.795790
19. 3 to be 3.0.
20. K. Sugi, H. Ishii, Y. Kimura, M. Niwano, E. Ito, Y. Washizu, N. Hayashi, Y. Ouchi, and K. Seki, Thin Solid Films THSFAP 0040-6090 464-465, 412 (2004). 10.1016/j.tsf.2004.06.035
21. K. Ozasa, S. Nemoto, T. Isoshima, E. Ito, M. Maeda, and M. Hara, Appl. Phys. Lett. APPLAB 0003-6951 93, 263304 (2008). 10.1063/1.3058439
22. R. Priestley, I. Sokolik, A. D. Walser, C. W. Tang, and R. Dorsinville, Synth. Met. SYMEDZ 0379-6779 84, 915 (1997). 10.1016/S0379-6779(96)04210-5
23. K. Thangaraju, P. Amaladass, K. S. Bharathi, A. K. Mohanakrishnan, V. Narayanan, and J. Kumar, Appl. Surf. Sci. ASUSEE 0169-4332 255, 5760 (2009). 10.1016/j.apsusc.2008.12.079
24. T. Ikeda, H. Murata, Y. Kinoshita, J. Shike, Y. Ikeda, and M. Kitano, Chem. Phys. Lett. CHPLBC 0009-2614 426, 111 (2006). 10.1016/j.cplett.2006.06.002