Low-cost growth of AlN using vectored-flow epitaxy for the purpose of water sterilisation in a rural environment

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 2, 2008, Pages 559-562

  Branch, Matthew ^a   Robinson, Mike ^a   Jones, Glyn ^a   Mason, Nigel ^b   Dixon, Jim ^c  

^a EMF Semiconductor Systems Ltd   (Ireland)

^b k Space Associates Inc   (United States)

^c Chesterton Mill   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ALN; COST-EFFECTIVE SOLUTIONS; DRINKING WATER; GASEOUS REAGENTS; GROWTH CHAMBER; GROWTH TECHNIQUES; HIGH GROWTH TEMPERATURES; METALORGANIC CHEMICAL VAPOUR DEPOSITION; MOCVD; PRE-CRACKS; RURAL ENVIRONMENT; STERILISATION; THERMAL DECOMPOSITIONS; TRIMETHYLALUMINIUM; ULTRA-VIOLET LIGHT; V/III RATIO; WATER PURIFICATION;

AMMONIA; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; LIGHT EMITTING DIODES; POTABLE WATER; PYROLYSIS; THERMOGRAVIMETRIC ANALYSIS; WATER SUPPLY;

WATER TREATMENT;

EID: 77951124970     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200776832     Document Type: Conference Paper

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